Issued Patents All Time
Showing 26–27 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7452824 | Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters | Daniel J. Hoffman | 2008-11-18 |
| 7431859 | Plasma etch process using polymerizing etch gases with different etch and polymer-deposition rates in different radial gas injection zones with time modulation | Kallol Bera, Xiaoye Zhao, Kenny L. Doan, Paul Brillhart, Bruno Geoffrion +2 more | 2008-10-07 |