Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12125258 | Distributed retrieval method, apparatus, and system, computer device, and storage medium | Yanbin Yang | 2024-10-22 |
| 9431216 | ICP source design for plasma uniformity and efficiency enhancement | Gang Shi, Tuqiang Ni | 2016-08-30 |
| 9095038 | ICP source design for plasma uniformity and efficiency enhancement | Shi Gang, Tuqiang Ni | 2015-07-28 |
| 8093157 | Advanced processing technique and system for preserving tungsten in a device structure | Li Diao | 2012-01-10 |
| 7850139 | Transportation frame for oversize container and method of installing the frame onto the container | Tzan Hua Huang, Guohao Huang, Zhiqing Li, Ryan Xu, Niancheng Zhou +1 more | 2010-12-14 |
| 7799685 | System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing | Stephen E. Savas, David Dutton, Andreas Kadavanich, Rene George | 2010-09-21 |
| 7561258 | Wafer tilt detection apparatus and method | Li Hou, Stephen Hyatt | 2009-07-14 |
| 7067432 | Methodology for in-situ and real-time chamber condition monitoring and process recovery during plasma processing | Thorsten Lill | 2006-06-27 |
| 6808647 | Methodologies to reduce process sensitivity to the chamber condition | Zhiwen Sun, Dragan Podlesnik, Xueyu Qian | 2004-10-26 |
| 6635578 | Method of operating a dual chamber reactor with neutral density decoupled from ion density | John Holland, Xueyu Qian | 2003-10-21 |
| 6544896 | Method for enhancing etching of TiSix | Takakazu Kusuki, Xueyu Qian | 2003-04-08 |
| 6352049 | Plasma assisted processing chamber with separate control of species density | Gerald Yin, Arnold Kolandenko, Hong Ching Shan, Peter Loewenhardt, Chii Guang Lee +9 more | 2002-03-05 |
| 6008139 | Method of etching polycide structures | Shaoher X. Pan | 1999-12-28 |