Issued Patents All Time
Showing 51–75 of 115 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9799533 | Methods of etching films comprising transition metals | Jeffrey W. Anthis, Benjamin Schmiege | 2017-10-24 |
| 9799511 | Methods for depositing low k and low wet etch rate dielectric thin films | Ning Li, Mark Saly, Mihaela Balseanu, Li-Qun Xia | 2017-10-24 |
| 9721787 | Film deposition using tantalum precursors | Jeffrey W. Anthis | 2017-08-01 |
| 9716012 | Methods of selective layer deposition | Huixiong Dai, Patrick M. Martin, Timothy Michaelson, Kadthala Ramaya Narendrnath, Robert Jan Visser +2 more | 2017-07-25 |
| 9685325 | Carbon and/or nitrogen incorporation in silicon based films using silicon precursors with organic co-reactants by PE-ALD | Mark Saly, Jessica S. Kachian | 2017-06-20 |
| 9683287 | Deposition of films comprising aluminum alloys with high aluminum content | Srinivas Gandikota, Xinliang Lu, Wei V. Tang, Jing Zhou, Seshadri Ganguli +6 more | 2017-06-20 |
| 9643844 | Low temperature atomic layer deposition of films comprising SiCN or SiCON | — | 2017-05-09 |
| 9631278 | Metal silicide formation through an intermediate metal halogen compound | Bencherki Mebarki | 2017-04-25 |
| 9580799 | Nitrogen-containing ligands and their use in atomic layer deposition methods | Jeffrey W. Anthis | 2017-02-28 |
| 9530627 | Method for cleaning titanium alloy deposition | Srinivas Gandikota, Xinliang Lu, Kyoung-Ho BU, Jing Zhou, Seshadri Ganguli | 2016-12-27 |
| 9449843 | Selectively etching metals and metal nitrides conformally | Mikhail Korolik, Nitin K. Ingle, Jeffrey W. Anthis, David Knapp, Benjamin Schmiege | 2016-09-20 |
| 9434155 | Method and system for printhead alignment based on print medium width | Michael J. Linder, Paul S. Bonino | 2016-09-06 |
| 9390940 | Methods of etching films comprising transition metals | Jeffrey W. Anthis, Benjamin Schmiege | 2016-07-12 |
| 9382270 | Substituted silacyclopropane precursors and their use for the deposition of silicon-containing films | Mark Saly | 2016-07-05 |
| 9328415 | Methods for the deposition of manganese-containing films using diazabutadiene-based precursors | Jeffrey W. Anthis | 2016-05-03 |
| 9269574 | Methods of fabricating dielectric films from metal amidinate precursors | Steven C. H. Hung, Atif Noori, Yoshihide Senzaki | 2016-02-23 |
| 9196474 | Metal amide deposition precursors and their stabilization with an inert ampoule liner | David Knapp | 2015-11-24 |
| 9177783 | Substituted silacyclopropane precursors and their use for the deposition of silicon-containing films | Mark Saly | 2015-11-03 |
| 9145612 | Deposition of N-metal films comprising aluminum alloys | Srinivas Gandikota, Xinliang Lu, Shih Chung Chen, Wei V. Tang, Jing Zhou +8 more | 2015-09-29 |
| 9127031 | Bisamineazaallylic ligands and their use in atomic layer deposition methods | Jeffrey W. Anthis | 2015-09-08 |
| 9048294 | Methods for depositing manganese and manganese nitrides | Jing Tang, Zhefeng Li, Paul F. Ma | 2015-06-02 |
| 9040127 | Low temperature silicon carbide deposition process | — | 2015-05-26 |
| 9005704 | Methods for depositing films comprising cobalt and cobalt nitrides | Jeffrey W. Anthis, David Knapp, Benjamin Schmiege | 2015-04-14 |
| 8927059 | Deposition of metal films using alane-based precursors | Xinliang Lu, Jeffrey W. Anthis, Mei Chang, Seshadri Ganguli, Wei V. Tang +2 more | 2015-01-06 |
| 8927438 | Methods for manufacturing high dielectric constant films | Hyungjun Kim, Woo-Hee Kim, Min-Kyu Kim, Steven C. H. Hung, Atif Noori +1 more | 2015-01-06 |