Issued Patents All Time
Showing 51–75 of 175 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7977246 | Thermal annealing method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere | Haichun Yang, Chien-Teh Kao, Xinliang Lu | 2011-07-12 |
| 7939422 | Methods of thin film process | Nitin K. Ingle, Jing Tang, Yi Zheng, Zheng Yuan, Zhenbin Ge +4 more | 2011-05-10 |
| 7923069 | Multi-station deposition apparatus and method | Lawrence Chung-Lai Lei, Walter Glenn | 2011-04-12 |
| 7910165 | Ruthenium layer formation for copper film deposition | Seshadri Ganguli, Kavita Shah, Nirmaya Maity | 2011-03-22 |
| 7910853 | Direct real-time monitoring and feedback control of RF plasma output for wafer processing | David T. Or, Yu-Tzu Chang, William Kuang, Joel M. Huston, Chien-Teh Kao | 2011-03-22 |
| 7871926 | Methods and systems for forming at least one dielectric layer | Li-Qun Xia, Mihaela Balseanu, Victor Nguyen, Derek R. Witty, Hichem M'Saad +3 more | 2011-01-18 |
| 7867789 | Contact clean by remote plasma and repair of silicide surface | Xinliang Lu, Chien-Teh Kao, Chiukin Lai | 2011-01-11 |
| 7846824 | Methods for forming a titanium nitride layer | Keyvan Kashefizadeh, Zhigang Xie, Ashish Bodke | 2010-12-07 |
| 7838441 | Deposition and densification process for titanium nitride barrier layers | Amit Khandelwal, Avgerinos V. Gelatos, Christophe Marcadal | 2010-11-23 |
| 7794789 | Multi-station deposition apparatus and method | Lawrence Chung-Lai Lei, Walter Glenn | 2010-09-14 |
| 7780793 | Passivation layer formation by plasma clean process to reduce native oxide growth | Haichun Yang, Xinliang Lu, Chien-Teh Kao | 2010-08-24 |
| 7780785 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Alan Ouye +1 more | 2010-08-24 |
| 7699023 | Gas delivery apparatus for atomic layer deposition | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung, Alan Ouye +1 more | 2010-04-20 |
| 7691442 | Ruthenium or cobalt as an underlayer for tungsten film deposition | Srinivas Gandikota, Madhu Moorthy, Amit Khandelwal, Avgerinos V. Gelatos, Kavita Shah +1 more | 2010-04-06 |
| 7605083 | Formation of composite tungsten films | Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more | 2009-10-20 |
| 7597758 | Chemical precursor ampoule for vapor deposition processes | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-10-06 |
| 7591907 | Apparatus for hybrid chemical processing | Ling Chen, Vincent Ku, Dien-Yeh Wu, Hua Chung | 2009-09-22 |
| 7588736 | Apparatus and method for generating a chemical precursor | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-09-15 |
| 7550381 | Contact clean by remote plasma and repair of silicide surface | Xinliang Lu, Chien-Teh Kao, Chiukin Lai | 2009-06-23 |
| 7547465 | Multi-station deposition apparatus and method | Lawrence Chung-Lai Lei, Walter Glenn | 2009-06-16 |
| 7524374 | Method and apparatus for generating a precursor for a semiconductor processing system | Ling Chen, Vincent Ku, Hua Chung, Christophe Marcadal, Seshadri Ganguli +3 more | 2009-04-28 |
| 7520957 | Lid assembly for front end of line fabrication | Chien-Teh Kao, Jing-Pei (Connie) Chou, Chiukin (Steven) Lai, Sal Umotoy, Joel M. Huston +6 more | 2009-04-21 |
| 7521379 | Deposition and densification process for titanium nitride barrier layers | Amit Khandelwal, Avgerinos V. Gelatos, Christophe Marcadal | 2009-04-21 |
| 7507660 | Deposition processes for tungsten-containing barrier layers | Ling Chen | 2009-03-24 |
| 7494908 | Apparatus for integration of barrier layer and seed layer | Hua Chung, Ling Chen, Jick Yu | 2009-02-24 |