Issued Patents All Time
Showing 51–75 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9914632 | Methods and apparatus for liquid chemical delivery | Ilker Durukan, Muhammad M. Rasheed | 2018-03-13 |
| 9847289 | Protective via cap for improved interconnect performance | Mehul Naik, Srinivas D. Nemani | 2017-12-19 |
| 9748354 | Multi-threshold voltage structures with a lanthanum nitride film and methods of formation thereof | Wei V. Tang, Steven C. H. Hung, Michael P. Chudzik, Siddarth A. Krishnan, Wenyu Zhang +6 more | 2017-08-29 |
| 9659814 | Doping control of metal nitride films | Annamalai Lakshmanan, Ben-Li Sheu, Guodan Wei, Nicole Lundy | 2017-05-23 |
| 9613859 | Direct deposition of nickel silicide nanowire | Annamalai Lakshmanan, Bencherki Mebarki, Kaushal K. Singh, Mehul Naik, Andrew Cockburn +1 more | 2017-04-04 |
| 9466524 | Method of depositing metals using high frequency plasma | Guojun Liu, Annamalai Lakshmanan, Dien-Yeh Wu, Anantha K. Subramani | 2016-10-11 |
| 9460932 | Surface poisoning using ALD for high selectivity deposition of high aspect ratio features | Jiang Lu, Guodan Wei | 2016-10-04 |
| 9418890 | Method for tuning a deposition rate during an atomic layer deposition process | Joseph AuBuchon, Jiang Lu, Mei Chang | 2016-08-16 |
| 9236467 | Atomic layer deposition of hafnium or zirconium alloy films | Timothy Weidman, Timothy Michaelson, Paul Deaton | 2016-01-12 |
| 9209074 | Cobalt deposition on barrier surfaces | Jiang Lu, Hyoung-Chan Ha, Seshadri Ganguli, Joseph AuBuchon, Sang Ho Yu +1 more | 2015-12-08 |
| 9109754 | Apparatus and method for providing uniform flow of gas | Joseph Yudovsky, Mei Chang, Faruk Gungor, David Chu, Chien-Teh Kao +2 more | 2015-08-18 |
| 9076661 | Methods for manganese nitride integration | Jennifer Meng Chu Tseng, Mei Chang, Annamalai Lakshmanan, Jing Tang | 2015-07-07 |
| 9051641 | Cobalt deposition on barrier surfaces | Jiang Lu, Hyoung-Chan Ha, Seshadri Ganguli, Joseph AuBuchon, Sang Ho Yu +1 more | 2015-06-09 |
| 9048183 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu +4 more | 2015-06-02 |
| 9048294 | Methods for depositing manganese and manganese nitrides | Jing Tang, Zhefeng Li, David Thompson | 2015-06-02 |
| 9032906 | Apparatus and process for plasma-enhanced atomic layer deposition | Kavita Shah, Dien-Yeh Wu, Seshadri Ganguli, Christophe Marcadal, Frederick Wu +1 more | 2015-05-19 |
| 8828866 | Methods for depositing a tantalum silicon nitride film | Guodan Wei | 2014-09-09 |
| 8815344 | Selective atomic layer depositions | — | 2014-08-26 |
| 8642468 | NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors | Seshadri Ganguli, Srinivas Gandikota, Yu Lei, Xinliang Lu, Sang Ho Yu +4 more | 2014-02-04 |
| 8491967 | In-situ chamber treatment and deposition process | Joseph AuBuchon, Mei Chang, Steven H. Kim, Dien-Yeh Wu, Norman Nakashima +2 more | 2013-07-23 |
| 7850779 | Apparatus and process for plasma-enhanced atomic layer deposition | Kavita Shah, Dien-Yeh Wu, Seshadri Ganguli, Christophe Marcadal, Frederick Wu +1 more | 2010-12-14 |
| 7833358 | Method of recovering valuable material from exhaust gas stream of a reaction chamber | Schubert S. Chu, Frederick Wu, Christophe Marcadal, Seshadri Ganguli, Dien-Yeh Wu +1 more | 2010-11-16 |
| 7832432 | Chemical delivery apparatus for CVD or ALD | Norman Nakashima, Christophe Marcadal, Seshadri Ganguli, Schubert S. Chu | 2010-11-16 |
| 7829150 | Growth of inorganic thin films using self-assembled monolayers as nucleation sites | James R. Engstrom, Aravind S. Killampalli | 2010-11-09 |
| 7780789 | Vortex chamber lids for atomic layer deposition | Dien-Yeh Wu, Puneet Bajaj, Xiaoxiong Yuan, Steven H. Kim, Schubert S. Chu +1 more | 2010-08-24 |