JE

James R. Engstrom

ST Symyx Technologies: 8 patents #47 of 198Top 25%
CF Cornell Research Foundation: 2 patents #418 of 1,638Top 30%
📍 Ithaca, NY: #162 of 1,653 inventorsTop 10%
🗺 New York: #13,384 of 115,490 inventorsTop 15%
Overall (All Time): #468,605 of 4,157,543Top 15%
11
Patents All Time

Issued Patents All Time

Showing 1–11 of 11 patents

Patent #TitleCo-InventorsDate
7829150 Growth of inorganic thin films using self-assembled monolayers as nucleation sites Aravind S. Killampalli, Paul F. Ma 2010-11-09
7281408 Parallel gas chromatograph with microdetector array Ravi Srinivasan, Daniel Pinkas, Shenheng Guan, Michael Myslovaty, Mikhail Spitkovsy +1 more 2007-10-16
7150994 Parallel flow process optimization reactor H. Sam Bergh, Shenheng Guan, Daniel Pinkas, Kyle Self 2006-12-19
7122156 Parallel flow reactor having variable composition H. Sam Bergh, Shenheng Guan, Daniel Pinkas, Kyle Self 2006-10-17
7118917 Parallel flow reactor having improved thermal control H. Sam Bergh, Shenheng Guan, Steffen Hardt, Astrid Lohf, Frank Michel 2006-10-10
6936471 Instrument for high throughput measurement of material physical properties and method of using same Damian Hajduk, Eric Carlson, J. Christopher Freitag, Oleg Kolosov, Adam Safir +2 more 2005-08-30
6772642 High throughput mechanical property and bulge testing of materials libraries Damian Hajduk, Eric Carlson, J. Christopher Freitag, Oleg Kolosov, Adam Safir +2 more 2004-08-10
6701774 Parallel gas chromatograph with microdetector array Ravi Srinivasan, Daniel Pinkas, Shenheng Guan, Michael Myslovaty, Michael Spitkovsky +1 more 2004-03-09
6690179 High throughput mechanical property testing of materials libraries using capacitance Damian Hajduk, Eric Carlson, J. Christopher Freitag, Oleg Kolosov, Adam Safir +2 more 2004-02-10
6650102 High throughput mechanical property testing of materials libraries using a piezoelectric Damian Hajduk, Eric Carlson, J. Christopher Freitag, Oleg Kolosov, Adam Safir +2 more 2003-11-18
5834379 Process for synthesis of cubic GaN on GaAs using NH.sub.3 in an RF plasma process James R. Shealy, Yu-Hwa Lo 1998-11-10