Issued Patents All Time
Showing 101–125 of 238 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8018164 | Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources | Steven C. Shannon, Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller | 2011-09-13 |
| 8002945 | Method of plasma load impedance tuning for engineered transients by synchronized modulation of an unmatched low power RF generator | Steven C. Shannon, Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller | 2011-08-23 |
| 7989329 | Removal of surface dopants from a substrate | Kartik Ramaswamy, Biagio Gallo, Hiroji Hanawa, Majeed A. Foad, Martin A. Hilkene +2 more | 2011-08-02 |
| 7988815 | Plasma reactor with reduced electrical skew using electrical bypass elements | Shahid Rauf, Kallol Bera, Kartik Ramaswamy, Hiroji Hanawa, Andrew Nguyen +5 more | 2011-08-02 |
| 7972469 | Plasma processing apparatus | Hiroji Hanawa, Andrew Nguyen, Keiji Horioka, Kallol Bera, Lawrence Wong +3 more | 2011-07-05 |
| 7967944 | Method of plasma load impedance tuning by modulation of an unmatched low power RF generator | Steven C. Shannon, Kartik Ramaswamy, Daniel J. Hoffman, Matthew L. Miller | 2011-06-28 |
| 7967996 | Process for wafer backside polymer removal and wafer front side photoresist removal | Hiroji Hanawa, Andrew Nguyen, Shahid Rauf, Ajit Balakrishna, Valentin N. Todorow +6 more | 2011-06-28 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-02-08 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Hiroji Hanawa, Kartik Ramaswamy, Douglas A. Buchberger, Jr., Shahid Rauf, Kallol Bera +10 more | 2011-02-01 |
| 7777599 | Methods and apparatus for controlling characteristics of a plasma | Steven C. Shannon, Daniel J. Hoffman, Matthew L. Miller, Olga Regelman, Kartik Ramaswamy +1 more | 2010-08-17 |
| 7767561 | Plasma immersion ion implantation reactor having an ion shower grid | Hiroji Hanawa, Tsutomu Tanaka, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2010-08-03 |
| 7700465 | Plasma immersion ion implantation process using a plasma source having low dissociation and low minimum plasma voltage | Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo +1 more | 2010-04-20 |
| 7696117 | Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas | Jennifer Y. Sun, Ren-Guan Duan, Jie Yuan, Li Xu | 2010-04-13 |
| 7695590 | Chemical vapor deposition plasma reactor having plural ion shower grids | Hiroji Hanawa, Tsutomu Tanaka, Amir Al-Bayati, Kartik Ramaswamy, Andrew Nguyen | 2010-04-13 |
| 7666464 | RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor | Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Andrew Nguyen, Biagio Gallo | 2010-02-23 |
| 7642180 | Semiconductor on insulator vertical transistor fabrication and doping process | Amir Al-Bayati, Hiroji Hanawa, Kartik Ramaswamy, Biagio Gallo, Andrew Nguyen | 2010-01-05 |
| 7552736 | Process for wafer backside polymer removal with a ring of plasma under the wafer | Hiroji Hanawa, Andrew Nguyen, Ajit Balakrishna, David Palagashvili, James P. Cruse +7 more | 2009-06-30 |
| 7479456 | Gasless high voltage high contact force wafer contact-cooling electrostatic chuck | Douglas A. Buchberger, Jr., Daniel J. Hoffman, Kartik Ramaswamy, Andrew Nguyen, Hiorji Hanawa +1 more | 2009-01-20 |
| 7465478 | Plasma immersion ion implantation process | Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Amir Al-Bayati, Biagio Gallo | 2008-12-16 |
| 7430984 | Method to drive spatially separate resonant structure with spatially distinct plasma secondaries using a single generator and switching elements | Hiroji Hanawa, Kartik Ramaswamy, Andrew Nguyen, Gonzalo Monroy | 2008-10-07 |
| 7428915 | O-ringless tandem throttle valve for a plasma reactor chamber | Andrew Nguyen, Hiroji Hanawa, Kartik Ramaswamy, Amir Al-Bayati, Biagio Gallo | 2008-09-30 |
| 7429532 | Semiconductor substrate process using an optically writable carbon-containing mask | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kai Ma, Vijay Parihar +4 more | 2008-09-30 |
| 7422775 | Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing | Kartik Ramaswamy, Hiroji Hanawa, Biagio Gallo, Kai Ma, Vijay Parihar +4 more | 2008-09-09 |
| 7407081 | Methods and apparatus for transferring conductive pieces during semiconductor device fabrication | Michael R. Rice, Claes Bjorkman, Jun Zhao, Thomas Miu | 2008-08-05 |