Issued Patents All Time
Showing 151–175 of 238 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6736931 | Inductively coupled RF plasma reactor and plasma chamber enclosure structure therefor | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Craig A. Roderick | 2004-05-18 |
| 6721162 | Electrostatic chuck having composite dielectric layer and method of manufacture | Edwin C. Weldon, Arik Donde, Brian Lue, Dan Maydan, Robert Steger +8 more | 2004-04-13 |
| 6634313 | High-frequency electrostatically shielded toroidal plasma and radical source | Hiroji Hanawa, John Trow, David Stover, Fernando Silveira | 2003-10-21 |
| 6623596 | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more | 2003-09-23 |
| 6589437 | Active species control with time-modulated plasma | — | 2003-07-08 |
| 6572732 | Parallel-plate electrode plasma reactor having an inductive antenna coupling power through a parallel plate electrode | — | 2003-06-03 |
| 6551446 | Externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2003-04-22 |
| 6545420 | Plasma reactor using inductive RF coupling, and processes | Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +6 more | 2003-04-08 |
| 6544429 | Enhancement of silicon oxide etch rate and substrate selectivity with xenon addition | Hoiman Hung, Joseph P. Caulfield, Hongchin Shan, Chunshi Cui, Michael R. Rice | 2003-04-08 |
| 6524432 | Parallel-plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more | 2003-02-25 |
| 6518195 | Plasma reactor using inductive RF coupling, and processes | Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick, David W. Groechel +7 more | 2003-02-11 |
| 6514376 | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna | Michael R. Rice, Eric Askarinam, Douglas A. Buchberger, Jr., Craig A. Roderick | 2003-02-04 |
| 6494986 | Externally excited multiple torroidal plasma source | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-12-17 |
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick, David W. Groechel +7 more | 2002-12-03 |
| 6468388 | Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-10-22 |
| 6454898 | Inductively coupled RF Plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam, Gerhard Schneider +5 more | 2002-09-24 |
| 6453842 | Externally excited torroidal plasma source using a gas distribution plate | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-09-24 |
| 6444137 | Method for processing substrates using gaseous silicon scavenger | Chan-Lon Yang, Jerry Wong, Jeffrey Marks, Peter Keswick, David W. Groechel | 2002-09-03 |
| 6444085 | Inductively coupled RF plasma reactor having an antenna adjacent a window electrode | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Craig A. Roderick | 2002-09-03 |
| 6444084 | Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna | — | 2002-09-03 |
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn, Craig A. Roderick +5 more | 2002-08-27 |
| 6440221 | Process chamber having improved temperature control | Shamouil Shamouilian, Ananda H. Kumar, Kadthala Ramaya Narendrnath, Eric Askarinam, Edwin C. Weldon +1 more | 2002-08-27 |
| 6414834 | Dielectric covered electrostatic chuck | Edwin C. Weldon, Arik Donde, Brian Lue, Dan Maydan, Robert Steger +8 more | 2002-07-02 |
| 6410449 | Method of processing a workpiece using an externally excited torroidal plasma source | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-06-25 |
| 6365063 | Plasma reactor having a dual mode RF power application | Michael R. Rice, Farahmand Askarinam, Douglas A. Buchberger, Jr., Craig A. Roderick | 2002-04-02 |