Issued Patents All Time
Showing 176–200 of 238 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6361644 | Parallel-plate electrode reactor having an inductive antenna coupling power through a parallel plate electrode | — | 2002-03-26 |
| 6348126 | Externally excited torroidal plasma source | Hiroji Hanawa, Yan Ye, Kartik Ramaswamy, Andrew Nguyen, Tsutomu Tanaka | 2002-02-19 |
| 6251792 | Plasma etch processes | Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +7 more | 2001-06-26 |
| 6252354 | RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control | Craig A. Roderick, Douglas A. Buchberger, Jr., John Trow, Viktor Shel | 2001-06-26 |
| 6238588 | High pressure high non-reactive diluent gas content high plasma ion density plasma oxide etch process | David W. Groechel, Raymond Hung, Michael R. Rice, Gerald Yin, Jian Ding +1 more | 2001-05-29 |
| 6218312 | Plasma reactor with heated source of a polymer-hardening precursor material | Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn, Craig A. Roderick +5 more | 2001-04-17 |
| 6217785 | Scavenging fluorine in a planar inductively coupled plasma reactor | Jeffrey Marks | 2001-04-17 |
| 6193836 | Center gas feed apparatus for a high density plasma reactor | Jon Mohn, Mei Chang, Raymond Hung, Ru-Liang Lee | 2001-02-27 |
| 6194325 | Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography | Chan-Lon Yang, Jeffrey Marks, Nicolas Bright, David W. Groechel, Peter Keswick | 2001-02-27 |
| 6167834 | Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 2001-01-02 |
| 6165311 | Inductively coupled RF plasma reactor having an overhead solenoidal antenna | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Craig A. Roderick | 2000-12-26 |
| 6108189 | Electrostatic chuck having improved gas conduits | Edwin C. Weldon, Arik Donde, Brian Lue, Dan Maydan, Robert Steger +8 more | 2000-08-22 |
| 6095084 | High density plasma process chamber | Shamouil Shamouilian, Ananda H. Kumar, Arnold Kholodenko, Dennis S. Grimard, Jonathan D. Mohn +1 more | 2000-08-01 |
| 6095083 | Vacuum processing chamber having multi-mode access | Michael R. Rice, Eric Askarinam, Gerhard Schneider | 2000-08-01 |
| 6090303 | Process for etching oxides in an electromagnetically coupled planar plasma apparatus | Jeffrey Marks | 2000-07-18 |
| 6077384 | Plasma reactor having an inductive antenna coupling power through a parallel plate electrode | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more | 2000-06-20 |
| 6074512 | Inductively coupled RF plasma reactor having an overhead solenoidal antenna and modular confinement magnet liners | Michael R. Rice, Douglas A. Buchberger, Jr., Craig A. Roderick, Eric Askarinam, Gerhard Schneider +5 more | 2000-06-13 |
| 6068784 | Process used in an RF coupled plasma reactor | Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong, Jeffrey Marks +6 more | 2000-05-30 |
| 6063233 | Thermal control apparatus for inductively coupled RF plasma reactor having an overhead solenoidal antenna | Michael R. Rice, Eric Askarinam, Douglas A. Buchberger, Jr., Craig A. Roderick | 2000-05-16 |
| 6054013 | Parallel plate electrode plasma reactor having an inductive antenna and adjustable radial distribution of plasma ion density | Michael R. Rice, John Trow, Douglas A. Buchberger, Jr., Eric Askarinam, Joshua Chiu-Wing Tsui +2 more | 2000-04-25 |
| RE36623 | Process for PECVD of silicon oxide using TEOS decomposition | David N. Wang, John M. White, Kam S. Law, Cissy Leung, Salvador P. Umotoy +3 more | 2000-03-21 |
| 6036878 | Low density high frequency process for a parallel-plate electrode plasma reactor having an inductive antenna | — | 2000-03-14 |
| 6036877 | Plasma reactor with heated source of a polymer-hardening precursor material | Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn, Craig A. Roderick +5 more | 2000-03-14 |
| 6027606 | Center gas feed apparatus for a high density plasma reactor | John W. Mohn, Mei Chang, Raymond Hung, Ru-Liang Lee | 2000-02-22 |
| 6024826 | Plasma reactor with heated source of a polymer-hardening precursor material | Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn, Craig A. Roderick +5 more | 2000-02-15 |