| 10615004 |
Distributed electrode array for plasma processing |
Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo |
2020-04-07 |
| 10418225 |
Distributed electrode array for plasma processing |
Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo |
2019-09-17 |
| 10373807 |
Distributed electrode array for plasma processing |
Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo |
2019-08-06 |
| 10312056 |
Distributed electrode array for plasma processing |
Kenneth S. Collins, Michael R. Rice, Kartik Ramaswamy, James D. Carducci, Yue Guo |
2019-06-04 |
| 9799491 |
Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching |
Leonid Dorf, Kenneth S. Collins, Shahid Rauf, Kartik Ramaswamy, James D. Carducci +2 more |
2017-10-24 |
| 9570275 |
Heated showerhead assembly |
James D. Carducci, Kallol Bera, Douglas A. Buchberger, Jr., Paul Brillhart |
2017-02-14 |
| 9196462 |
Showerhead insulator and etch chamber liner |
James D. Carducci |
2015-11-24 |
| 8876024 |
Heated showerhead assembly |
James D. Carducci, Kallol Bera, Douglas A. Buchberger, Jr., Paul Brillhart |
2014-11-04 |
| 7777599 |
Methods and apparatus for controlling characteristics of a plasma |
Steven C. Shannon, Daniel J. Hoffman, Matthew L. Miller, Kenneth S. Collins, Kartik Ramaswamy +1 more |
2010-08-17 |
| 7196283 |
Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface |
Douglas A. Buchberger, Jr., Daniel J. Hoffman, James D. Carducci, Keiji Horioka, Jang-Gyoo Yang |
2007-03-27 |
