| D998575 |
Collimator for use in a physical vapor deposition (PVD) chamber |
Martin Lee Riker, Fuhong Zhang, Kishor Kalathiparambil |
2023-09-12 |
| D997111 |
Collimator for use in a physical vapor deposition (PVD) chamber |
Martin Lee Riker, Fuhong Zhang, Kishor Kalathiparambil |
2023-08-29 |
| 11527437 |
Methods and apparatus for intermixing layer for enhanced metal reflow |
Fuhong Zhang, Gang Shen, Feng Chen, Rui Li, Xiangjin Xie +2 more |
2022-12-13 |
| 11492699 |
Substrate temperature non-uniformity reduction over target life using spacing compensation |
Suhas Bangalore Umesh, Preetham Rao, Shirish A. PETHE, Fuhong Zhang, Kishor Kalathiparambil +1 more |
2022-11-08 |
| 11315771 |
Methods and apparatus for processing a substrate |
Xiangjin Xie, Fuhong Zhang, Shirish A. PETHE, Martin Lee Riker, Lewis Yuan Tse Lo +2 more |
2022-04-26 |
| 11289329 |
Methods and apparatus for filling a feature disposed in a substrate |
Rui Li, Xiangjin Xie, Fuhong Zhang, Shirish A. PETHE, Adolph Miller Allen +1 more |
2022-03-29 |
| 11222816 |
Methods and apparatus for semi-dynamic bottom up reflow |
Shirish A. PETHE, Fuhong Zhang, Joung Joo Lee, Kishor Kalathiparambil, Xiangjin Xie +1 more |
2022-01-11 |
| 11152608 |
Modified silicon particle electrodes and methods |
Lorenzo Mangolini |
2021-10-19 |
| D859333 |
Collimator for a physical vapor deposition chamber |
Martin Lee Riker, Fuhong Zhang, Zheng Wang |
2019-09-10 |
| D858468 |
Collimator for a physical vapor deposition chamber |
Martin Lee Riker, Fuhong Zhang, Zheng Wang |
2019-09-03 |
| 10084184 |
Conformal coating of nano-porous material with group IV semiconductor using nanoparticle ink |
Lorenzo Mangolini |
2018-09-25 |
