Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10249479 | Magnet configurations for radial uniformity tuning of ICP plasmas | Joseph AuBuchon, Travis Koh, Nattaworn Boss Nunta, Sheng-Chin Kung, Steven Lane +2 more | 2019-04-02 |
| 10115566 | Method and apparatus for controlling a magnetic field in a plasma chamber | Steven Lane, Kartik Ramaswamy, Travis Koh, Joseph AuBuchon, Yang Yang | 2018-10-30 |
| 10109462 | Dual radio-frequency tuner for process control of a plasma process | Edward P. Hammond, IV, Abdul Aziz Khaja | 2018-10-23 |
| 10060024 | Sputtering target for PVD chamber | Zhendong Liu, Rongjun Wang, Xianmin Tang, Srinivas Gandikota, Muhammad M. Rasheed | 2018-08-28 |
| 9779953 | Electromagnetic dipole for plasma density tuning in a substrate processing chamber | Joseph AuBuchon, Samer Banna | 2017-10-03 |
| 9752228 | Sputtering target for PVD chamber | Zhendong Liu, Rongjun Wang, Xianmin Tang, Srinivas Gandikota, Muhammad M. Rasheed | 2017-09-05 |
| 9646843 | Tunable magnetic field to improve uniformity | Andrew Nguyen, Haitao Wang, Maxim Mikhailovich Noginov, Reza Sadjadi, Chunlei Zhang +1 more | 2017-05-09 |
| 9620339 | Sputter source for semiconductor process chambers | Anantha K. Subramani, Prashanth Kothnur, Hanbing Wu | 2017-04-11 |
| 9613783 | Method and apparatus for controlling a magnetic field in a plasma chamber | Steven Lane, Kartik Ramaswamy, Travis Koh, Joseph AuBuchon, Yang Yang | 2017-04-04 |
| 9499901 | High density TiN RF/DC PVD deposition with stress tuning | Yong Cao, Xianmin Tang, Adolph Miller Allen | 2016-11-22 |
| 9028659 | Magnetron design for extended target life in radio frequency (RF) plasmas | Alan A. Ritchie, Zhenbin Ge, Vivek Gupta | 2015-05-12 |
| 8992741 | Method for ultra-uniform sputter deposition using simultaneous RF and DC power on target | Rongjun Wang, Xianmin Tang, Zhendong Liu, Maurice E. Ewert | 2015-03-31 |
| 8871064 | Electromagnet array in a sputter reactor | Xinyu Fu, Arvind Sundarrajan, Edward P. Hammond, IV, Praburam Gopalraja, John C. Forster +2 more | 2014-10-28 |
| 8841211 | Methods for forming interconnect structures | Joung Joo Lee, Xianmin Tang | 2014-09-23 |
| 8685215 | Mechanism for continuously varying radial position of a magnetron | Keith A. Miller, Anantha K. Subramani, Maurice E. Ewert, Hong Yang, Vincent E. Burkhart | 2014-04-01 |
| 8580094 | Magnetron design for RF/DC physical vapor deposition | Rongjun Wang, Sally S. Lou, Muhammad M. Rasheed, Jianxin Lei, Xianmin Tang +4 more | 2013-11-12 |
| 8557094 | Sputtering chamber having auxiliary backside magnet to improve etch uniformity and magnetron producing sustained self sputtering of ruthenium and tantalum | Xianmin Tang, Hua Chung, Rongjun Wang, Praburam Gopalraja, Jick Yu +1 more | 2013-10-15 |
| 8476162 | Methods of forming layers on substrates | Tae Hong Ha, Winsor Lam, Joung Joo Lee | 2013-07-02 |
| 7829456 | Method to modulate coverage of barrier and seed layer using titanium nitride | Winsor Lam, Hong Yang, Adolph Miller Allen | 2010-11-09 |
| 7767064 | Position controlled dual magnetron | Cristopher M. Pavloff, Winsor Lam, Hong Yang, Ilyoung Richard Hong | 2010-08-03 |
| 7736473 | Magnetron having continuously variable radial position | Keith A. Miller, Anantha K. Subramani, Maurice E. Ewert, Hong Yang, Vincent E. Burkhart | 2010-06-15 |
| 7686926 | Multi-step process for forming a metal barrier in a sputter reactor | Xinyu Fu, Arvind Sundarrajan, Edward P. Hammond, IV, Praburam Gopalraja, John C. Forster +2 more | 2010-03-30 |
| 7686928 | Pressure switched dual magnetron | — | 2010-03-30 |
| 7569125 | Shields usable with an inductively coupled plasma reactor | Xianmin Tang, John C. Forster, Peijun Ding, Marc Schweitzer, Keith A. Miller +1 more | 2009-08-04 |
| 7527713 | Variable quadruple electromagnet array in plasma processing | Mark Perrin, Andrew Gillard | 2009-05-05 |