| 12512359 |
Wafer jig, wafer structure and wafer processing method |
Chan-Ju Wen, Chung-Ju Tsai |
2025-12-30 |
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| 12393699 |
High-temporal-accuracy electromagnetic fault injection method and apparatus for cryptographic chip |
Xianzhao Xia, Yujia Li, Mingyang Li, Rui Zhao, Ruiqing Zhai +4 more |
2025-08-19 |
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| 12223839 |
Testing method for blind spot detection system for automobile, device, and medium |
Guotian Ji, Jinfeng Gong, Hang Sun, Zhao Wang, Hui Rong +9 more |
2025-02-11 |
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| 12224809 |
OTA test method for vehicle antenna system, device, and storage medium |
Guotian Ji, Hang Sun, Jinfeng Gong, Zhao Wang, Hui Rong +4 more |
2025-02-11 |
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| 11802340 |
UHV in-situ cryo-cool chamber |
Bharath Swaminathan, John Mazzocco, Ashish Goel, Anantha K. Subramani |
2023-10-31 |
$79,893,000 |
| 11600476 |
Deposition system with multi-cathode and method of manufacture thereof |
Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Prashanth Kothnur, Chi Hong Ching |
2023-03-07 |
$32,704,000 |
| 11459651 |
Paste method to reduce defects in dielectric sputtering |
Xiaodong Wang, Rongjun Wang |
2022-10-04 |
$41,370,000 |
| 11183375 |
Deposition system with multi-cathode and method of manufacture thereof |
Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Prashanth Kothnur, Chi Hong Ching |
2021-11-23 |
$124,354,000 |
| 11101117 |
Methods and apparatus for co-sputtering multiple targets |
Anantha K. Subramani, Wei Wang, Ashish Goel, Srinivas Guggilla, Lavinia Nistor |
2021-08-24 |
$92,770,000 |
| 11043364 |
Process kit for multi-cathode processing chamber |
Anantha K. Subramani, Ashish Goel, Deepak Jadhav, Rongjun Wang, Chi Hong Ching |
2021-06-22 |
$66,836,000 |
| 11011357 |
Methods and apparatus for multi-cathode substrate processing |
Anantha K. Subramani, Ashish Goel, Xiaodong Wang, Wei Wang, Rongjun Wang +1 more |
2021-05-18 |
$51,490,000 |
| 10978276 |
Substrate processing apparatus including top reflector above annular lamp assembly |
Bharath Swaminathan, John Mazzocco |
2021-04-13 |
$179,762,000 |
| 10704139 |
Plasma chamber target for reducing defects in workpiece during dielectric sputtering |
Xiaodong Wang, Rongjun Wang |
2020-07-07 |
$29,619,000 |
| 10573498 |
Substrate processing apparatus including annular lamp assembly |
Bharath Swaminathan, John Mazzocco |
2020-02-25 |
$22,337,000 |
| 10468238 |
Methods and apparatus for co-sputtering multiple targets |
Anantha K. Subramani, Wei Wang, Ashish Goel, Srinivas Guggilla, Lavinia Nistor |
2019-11-05 |
$21,874,000 |
| 10249522 |
In-situ temperature measurement in a noisy environment |
Anantha K. Subramani, Wei Wang, Aaron Muir Hunter |
2019-04-02 |
$31,503,000 |
| 9673074 |
In-situ temperature measurement in a noisy environment |
Anantha K. Subramani, Wei Wang, Aaron Muir Hunter |
2017-06-06 |
$20,400,000 |
| 9620339 |
Sputter source for semiconductor process chambers |
Anantha K. Subramani, Tza-Jing Gung, Prashanth Kothnur |
2017-04-11 |
$31,319,000 |
