HW

Hanbing Wu

Applied Materials: 14 patents #962 of 7,310Top 15%
CC China Automotive Technology And Research Center Co.: 3 patents #13 of 131Top 10%
CC Catarc Automotive Test Center (Tianjin) Co.: 2 patents #22 of 96Top 25%
Overall (All Time): #262,454 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12393699 High-temporal-accuracy electromagnetic fault injection method and apparatus for cryptographic chip Xianzhao Xia, Yujia Li, Mingyang Li, Rui Zhao, Ruiqing Zhai +4 more 2025-08-19
12224809 OTA test method for vehicle antenna system, device, and storage medium Guotian Ji, Hang Sun, Jinfeng Gong, Zhao Wang, Hui Rong +4 more 2025-02-11
12223839 Testing method for blind spot detection system for automobile, device, and medium Guotian Ji, Jinfeng Gong, Hang Sun, Zhao Wang, Hui Rong +9 more 2025-02-11
11802340 UHV in-situ cryo-cool chamber Bharath Swaminathan, John Mazzocco, Ashish Goel, Anantha K. Subramani 2023-10-31
11600476 Deposition system with multi-cathode and method of manufacture thereof Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Prashanth Kothnur, Chi Hong Ching 2023-03-07
11459651 Paste method to reduce defects in dielectric sputtering Xiaodong Wang, Rongjun Wang 2022-10-04
11183375 Deposition system with multi-cathode and method of manufacture thereof Anantha K. Subramani, Deepak Jadhav, Ashish Goel, Prashanth Kothnur, Chi Hong Ching 2021-11-23
11101117 Methods and apparatus for co-sputtering multiple targets Anantha K. Subramani, Wei Wang, Ashish Goel, Srinivas Guggilla, Lavinia Nistor 2021-08-24
11043364 Process kit for multi-cathode processing chamber Anantha K. Subramani, Ashish Goel, Deepak Jadhav, Rongjun Wang, Chi Hong Ching 2021-06-22
11011357 Methods and apparatus for multi-cathode substrate processing Anantha K. Subramani, Ashish Goel, Xiaodong Wang, Wei Wang, Rongjun Wang +1 more 2021-05-18
10978276 Substrate processing apparatus including top reflector above annular lamp assembly Bharath Swaminathan, John Mazzocco 2021-04-13
10704139 Plasma chamber target for reducing defects in workpiece during dielectric sputtering Xiaodong Wang, Rongjun Wang 2020-07-07
10573498 Substrate processing apparatus including annular lamp assembly Bharath Swaminathan, John Mazzocco 2020-02-25
10468238 Methods and apparatus for co-sputtering multiple targets Anantha K. Subramani, Wei Wang, Ashish Goel, Srinivas Guggilla, Lavinia Nistor 2019-11-05
10249522 In-situ temperature measurement in a noisy environment Anantha K. Subramani, Wei Wang, Aaron Muir Hunter 2019-04-02
9673074 In-situ temperature measurement in a noisy environment Anantha K. Subramani, Wei Wang, Aaron Muir Hunter 2017-06-06
9620339 Sputter source for semiconductor process chambers Anantha K. Subramani, Tza-Jing Gung, Prashanth Kothnur 2017-04-11