BK

Bhaskar Kumar

Applied Materials: 26 patents #456 of 7,310Top 7%
Overall (All Time): #151,308 of 4,157,543Top 4%
26
Patents All Time

Issued Patents All Time

Showing 25 most recent of 26 patents

Patent #TitleCo-InventorsDate
12142468 Stress treatments for cover wafers Vinayak Vishwanath Hassan, Meng Cai, Sowjanya Musunuru, Kaushik Alayavalli, Andrew Nguyen 2024-11-12
12106958 Method of using dual frequency RF power in a process chamber Anup K. Singh, Rick Kustra, Vinayak Vishwanath Hassan, Krishna Nittala, Pramit Manna +2 more 2024-10-01
12020911 Chucking process and system for substrate processing chambers Ganesh Balasubramanian, Vivek Shah, Jiheng Zhao 2024-06-25
11996273 Methods of seasoning process chambers Vinayak Vishwanath Hassan, Anup K. Singh 2024-05-28
11959174 Shunt door for magnets in plasma process chamber Kallol Bera, Sathya Swaroop Ganta, Timothy Joseph Franklin, Kaushik Alayavalli, Akshay Dhanakshirur +1 more 2024-04-16
11859275 Techniques to improve adhesion and defects for tungsten carbide film Vivek Shah, Anup K. Singh, Ganesh Balasubramanian 2024-01-02
11721545 Method of using dual frequency RF power in a process chamber Anup K. Singh, Rick Kustra, Vinayak Vishwanath Hassan, Krishna Nittala, Pramit Manna +2 more 2023-08-08
11699585 Methods of forming hardmasks Jui-Yuan Hsu, Pramit Manna, Karthik Janakiraman 2023-07-11
11545376 Plasma parameters and skew characterization by high speed imaging Sidharth Bhatia, Edward P. Hammond, IV, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian 2023-01-03
11515191 Graded dimple height pattern on heater for lower backside damage and low chucking voltage Vivek Shah, Ganesh Balasubramanian 2022-11-29
11495440 Plasma density control on substrate edge Prashanth Kothnur, Sidharth Bhatia, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian +1 more 2022-11-08
11488811 Chucking process and system for substrate processing chambers Ganesh Balasubramanian, Vivek Shah, Jiheng Zhao 2022-11-01
11120976 Apparatus and methods for removing contaminant particles in a plasma process Anup K. Singh, Vivek Shah, Sidharth Bhatia, Ganesh Balasubramanian 2021-09-14
11069514 Remote capacitively coupled plasma source with improved ion blocker Vivek Shah, Vinayak Vishwanath Hassan, Ganesh Balasubramanian 2021-07-20
10892143 Technique to prevent aluminum fluoride build up on the heater Vivek Shah, Anup K. Singh, Ganesh Balasubramanian 2021-01-12
10790121 Plasma density control on substrate edge Prashanth Kothnur, Sidharth Bhatia, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian +1 more 2020-09-29
10748797 Plasma parameters and skew characterization by high speed imaging Sidharth Bhatia, Edward P. Hammond, IV, Anup K. Singh, Vivek Shah, Ganesh Balasubramanian 2020-08-18
10714319 Apparatus and methods for removing contaminant particles in a plasma process Anup K. Singh, Vivek Shah, Sidharth Bhatia, Ganesh Balasubramanian 2020-07-14
10688538 Aluminum fluoride mitigation by plasma treatment Vivek Shah, Anup K. Singh, Ganesh Balasubramanian, Bok Hoen Kim 2020-06-23
10074559 Selective poreseal deposition prevention and residue removal using SAM Geetika Bajaj, Tapash Chakraborty, Prerna Goradia, Robert Jan Visser, Deenesh Padhi 2018-09-11
9793108 Interconnect integration for sidewall pore seal and via cleanliness He Ren, Mehul Naik, Deenesh Padhi, Priyanka DASH, Alexandros T. Demos 2017-10-17
9780223 Gallium arsenide based materials used in thin film transistor applications Kaushal K. Singh, Robert Jan Visser 2017-10-03
9646876 Aluminum nitride barrier layer Deenesh Padhi, Srinivas Guggilla, Alexandros T. Demos, He Ren, Priyanka DASH 2017-05-09
9252392 Thin film encapsulation-thin ultra high barrier layer for OLED application Dieter Haas 2016-02-02
8895842 High quality TCO-silicon interface contact structure for high efficiency thin film silicon solar cells Shuran Sheng, Yong Kee Chae, Stefan Klein, Amir Al-Bayati 2014-11-25