HH

Hoyung David Hwang

Applied Materials: 2 patents #3,641 of 7,310Top 50%
Overall (All Time): #1,737,170 of 4,157,543Top 45%
2
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12416863 Dry develop process of photoresist Yuqiong Dai, Madhur Sachan, Regina Freed 2025-09-16
11495461 Film stack for lithography applications Tejinder Singh, Suketu Arun Parikh, Daniel Lee Diehl, Michael Stolfi, Jothilingam Ramalingam +3 more 2022-11-08