Issued Patents All Time
Showing 51–75 of 121 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8629370 | Assembly for delivering RF power and DC voltage to a plasma processing chamber | Hamid Tavassoli, Surajit Kumar, Shane C. Nevil | 2014-01-14 |
| 8617351 | Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction | Daniel J. Hoffman, Roger Alan Lindley, Michael Kutney, Martin Jeff Salinas, Hamid Tavassoli +1 more | 2013-12-31 |
| 8608900 | Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +1 more | 2013-12-17 |
| 8607731 | Cathode with inner and outer electrodes at different heights | Daniel J. Hoffman, Semyon L. Kats, Dan Katz | 2013-12-17 |
| 8546267 | Method of processing a workpiece in a plasma reactor using multiple zone feed forward thermal control | Paul Brillhart, Richard Fovell, Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2013-10-01 |
| 8337660 | Capacitively coupled plasma reactor having very agile wafer temperature control | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2012-12-25 |
| 8329586 | Method of processing a workpiece in a plasma reactor using feed forward thermal control | Paul Brillhart, Richard Fovell, Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2012-12-11 |
| 8270141 | Electrostatic chuck with reduced arcing | Michael D. Willwerth, David Palagashvili, Michael G. Chafin | 2012-09-18 |
| 8221580 | Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2012-07-17 |
| 8157951 | Capacitively coupled plasma reactor having very agile wafer temperature control | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +1 more | 2012-04-17 |
| 8092638 | Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +1 more | 2012-01-10 |
| 8092639 | Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2012-01-10 |
| 8080479 | Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Shahid Rauf, Kallol Bera +10 more | 2011-12-20 |
| 8076247 | Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Shahid Rauf, Kallol Bera +10 more | 2011-12-13 |
| 8074677 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion +1 more | 2011-12-13 |
| 8034180 | Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor | Paul Brillhart, Richard Fovell, Douglas H. Burns, Kallol Bera, Daniel J. Hoffman | 2011-10-11 |
| 8021521 | Method for agile workpiece temperature control in a plasma reactor using a thermal model | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +5 more | 2011-09-20 |
| 8012304 | Plasma reactor with a multiple zone thermal control feed forward control apparatus | Paul Brillhart, Richard Fovell, Hamid Tavassoli, Douglas H. Burns, Kallol Bera +1 more | 2011-09-06 |
| 7988872 | Method of operating a capacitively coupled plasma reactor with dual temperature control loops | Paul Brillhart, Richard Fovell, Douglas H. Burns, Kallol Bera, Daniel J. Hoffman +4 more | 2011-08-02 |
| 7972467 | Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor | Kallol Bera, Yan Ye, James D. Carducci, Daniel J. Hoffman, Steven C. Shannon | 2011-07-05 |
| 7968469 | Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Shahid Rauf, Kallol Bera +10 more | 2011-06-28 |
| 7884025 | Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Shahid Rauf, Kallol Bera +10 more | 2011-02-08 |
| 7879731 | Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources | Kenneth S. Collins, Hiroji Hanawa, Kartik Ramaswamy, Shahid Rauf, Kallol Bera +10 more | 2011-02-01 |
| 7846497 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion +1 more | 2010-12-07 |
| 7775236 | Method and apparatus for controlling gas flow to a processing chamber | Ezra Robert Gold, Richard Fovell, James P. Cruse, Jared Ahmad Lee, Bruno Geoffrion +1 more | 2010-08-17 |