Issued Patents All Time
Showing 26–50 of 178 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11410860 | Process chamber for etching low k and other dielectric films | Dmitry Lubomirsky, Srinivas D. Nemani, Sergey G. Belostotskiy | 2022-08-09 |
| 11387071 | Multi-source ion beam etch system | Qiwei Liang, Srinivas D. Nemani, Douglas A. Buchberger, Jr., Chentsau Chris Ying | 2022-07-12 |
| 11302549 | Substrate vacuum transport and storage apparatus | Sriskantharajah Thirunavukarasu, Eng Sheng Peh, Srinivas D. Nemani, Arvind Sundarrajan, Avinash Avula | 2022-04-12 |
| 11289331 | Methods for graphene formation using microwave surface-wave plasma on dielectric materials | Jie Zhou, Erica Chen, Qiwei Liang, Chentsau Chris Ying, Srinivas D. Nemani | 2022-03-29 |
| 11264460 | Vertical transistor fabrication for memory applications | Arvind Kumar, Sanjeev Manhas, Mahendra Pakala | 2022-03-01 |
| 11205589 | Methods and apparatuses for forming interconnection structures | He Ren, Hao Jiang, Mehul Naik, Srinivas D. Nemani | 2021-12-21 |
| 11145808 | Methods for etching a structure for MRAM applications | Jong Mun Kim, Minrui Yu, Chando Park, Mang-Mang Ling, Jaesoo Ahn +3 more | 2021-10-12 |
| 11114333 | Method for depositing and reflow of a high quality etch resistant gapfill dielectric film | Srinivas D. Nemani, Chentsau Ying | 2021-09-07 |
| 11114306 | Methods for depositing dielectric material | Bhargav S. Citla, Jethro Tannos, Jingyi Li, Douglas A. Buchberger, Jr., Zhong Qiang Hua +1 more | 2021-09-07 |
| 11049537 | Additive patterning of semiconductor film stacks | John O. Dukovic, Srinivas D. Nemani, Praburam Gopalraja, Steven Hiloong WELCH, Bhargav S. Citla | 2021-06-29 |
| 10998200 | High pressure annealing process for metal containing materials | Kaushal K. Singh, Mei-Yee Shek, Srinivas D. Nemani | 2021-05-04 |
| 10964527 | Residual removal | Jong Mun Kim, Biao Liu, Cheng Pan, Erica Chen, Chentsau Ying +1 more | 2021-03-30 |
| 10943779 | Method and system for three-dimensional (3D) structure fill | Ludovic Godet, Srinivas D. Nemani, Er-Xuan Ping, Gary E. Dickerson | 2021-03-09 |
| 10923367 | Process chamber for etching low K and other dielectric films | Dmitry Lubomirsky, Srinivas D. Nemani, Sergey G. Belostotskiy | 2021-02-16 |
| 10916426 | Formation of crystalline, layered transition metal dichalcogenides | Keith Tatseun Wong, Srinivas D. Nemani | 2021-02-09 |
| 10847360 | High pressure treatment of silicon nitride film | Keith Tatseun Wong, Sean S. Kang, Srinivas D. Nemani | 2020-11-24 |
| 10825665 | Directional treatment for multi-dimensional device processing | Ludovic Godet, Huixiong Dai, Srinivas D. Nemani, Nitin K. Ingle | 2020-11-03 |
| 10811250 | Silicon nitride films with high nitrogen content | Atashi Basu, Srinivas D. Nemani | 2020-10-20 |
| 10720341 | Gas delivery system for high pressure processing chamber | Qiwei Liang, Srinivas D. Nemani, Sean S. Kang, Adib Khan | 2020-07-21 |
| 10714331 | Method to fabricate thermally stable low K-FinFET spacer | Mihaela Balseanu, Srinivas D. Nemani, Mei-Yee Shek | 2020-07-14 |
| 10692734 | Methods of patterning nickel silicide layers on a semiconductor device | Jong Mun Kim, Chentsau Chris Ying, He Ren, Srinivas D. Nemani | 2020-06-23 |
| 10636704 | Seam-healing method upon supra-atmospheric process in diffusion promoting ambient | Bencherki Mebarki, Sean S. Kang, Keith Tatseun Wong, He Ren, Mehul Naik +1 more | 2020-04-28 |
| 10622214 | Tungsten defluorination by high pressure treatment | Keith Tatseun Wong, Thomas Jongwan Kwon, Sean S. Kang | 2020-04-14 |
| 10590530 | Gas control in process chamber | Qiwei Liang, Srinivas D. Nemani | 2020-03-17 |
| 10586707 | Selective deposition of metal silicides | Raymond Hung, Namsung Kim, Srinivas D. Nemani, Jong Hun Choi, Christopher Ahles +1 more | 2020-03-10 |