Issued Patents All Time
Showing 76–100 of 178 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9530674 | Method and system for three-dimensional (3D) structure fill | Ludovic Godet, Srinivas D. Nemani, Er-Xuan Ping, Gary E. Dickerson | 2016-12-27 |
| 9515166 | Selective atomic layer deposition process utilizing patterned self assembled monolayers for 3D structure semiconductor applications | Srinivas D. Nemani, Ludovic Godet, Yin Fan | 2016-12-06 |
| 9484202 | Apparatus and methods for spacer deposition and selective removal in an advanced patterning process | Jie Zhou, Chentsau Ying, Shambhu N. Roy, Srinivas D. Nemani, Jingjing Liu | 2016-11-01 |
| 9484274 | Methods for reducing semiconductor substrate strain variation | Christopher Dennis Bencher, Ehud Tzuri | 2016-11-01 |
| 9412613 | Development of high etch selective hardmask material by ion implantation into amorphous carbon films | Pramit Manna, Abhijit Basu Mallick, Ludovic Godet, Yongmei Chen, Jun Xue +2 more | 2016-08-09 |
| 9406522 | Single platform, multiple cycle spacer deposition and etch | Hao Chen, Chentsau Ying, Srinivas D. Nemani | 2016-08-02 |
| 9385219 | Method and apparatus for selective deposition | Srinivas D. Nemani, Ludovic Godet, Yin Fan, Tristan Y. Ma | 2016-07-05 |
| 9379021 | Method to reduce K value of dielectric layer for advanced FinFET formation | Ludovic Godet, Srinivas D. Nemani | 2016-06-28 |
| 8940642 | Method of multiple patterning of a low-K dielectric film | Srinivas D. Nemani, Yifeng Zhou, Dmitry Lubomirsky | 2015-01-27 |
| 8871650 | Post etch treatment (PET) of a low-K dielectric film | Srinivas D. Nemani, Nicolas Bright, Thorsten Lill, Yifeng Zhou, Jamie Saephan | 2014-10-28 |
| 8741775 | Method of patterning a low-K dielectric film | Srinivas D. Nemani, Yifeng Zhou, Dmitry Lubomirsky | 2014-06-03 |
| 8242031 | High quality silicon oxide films by remote plasma CVD from disilane precursors | Abhijit Basu Mallick, Srinivas D. Nemani | 2012-08-14 |
| 8232176 | Dielectric deposition and etch back processes for bottom up gapfill | Dmitry Lubomirsky, Srinivas D. Nemani | 2012-07-31 |
| 8153348 | Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch | Srinivas D. Nemani, Shankar Venkataraman | 2012-04-10 |
| 8143174 | Post-deposition treatment to enhance properties of Si-O-C low K films | Li-Qun Xia, Frederic Gaillard, Tian-Hoe Lim | 2012-03-27 |
| 8101525 | Method for fabricating a semiconductor device having a lanthanum-family-based oxide layer | Meihua Shen, Noel Sun, Nicolas Gani, Han-Hsiang Chen, Eric Pei +3 more | 2012-01-24 |
| 8022377 | Method and apparatus for excimer curing | Dmitry Lubomirsky, Muhammad M. Rasheed | 2011-09-20 |
| 7967913 | Remote plasma clean process with cycled high and low pressure clean steps | Zhong Qiang Hua, Sanjay Kamath, Young S. Lee, Hien Minh Le, Anjana M. Patel +1 more | 2011-06-28 |
| 7943531 | Methods for forming a silicon oxide layer over a substrate | Srinivas D. Nemani, Abhijit Basu Mallick | 2011-05-17 |
| 7867923 | High quality silicon oxide films by remote plasma CVD from disilane precursors | Abhijit Basu Mallick, Srinivas D. Nemani | 2011-01-11 |
| 7811411 | Thermal management of inductively coupled plasma reactors | Siqing Lu, Qiwei Liang, Irene Chou, Steven H. Kim, Young S. Lee +1 more | 2010-10-12 |
| 7789993 | Internal balanced coil for inductively coupled high density plasma processing chamber | Robert Chen, Canfeng Lai, Xinglong Chen, Weiyi Luo, Zhong Qiang Hua +4 more | 2010-09-07 |
| 7758698 | Dual top gas feed through distributor for high density plasma chamber | Won Bae Bang, Srivivas D. Nemani, Phong Pham | 2010-07-20 |
| 7678662 | Memory cell having stressed layers | Reza Arghavani, Hichem M'Saad | 2010-03-16 |
| 7651587 | Two-piece dome with separate RF coils for inductively coupled plasma reactors | Siqing Lu, Qiwei Liang, Canfeng Lai, Robert Chen, Jason Bloking +3 more | 2010-01-26 |