Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12300494 | Ion implantation process to form punch through stopper | Yan Zhang, Johannes M. van Meer | 2025-05-13 |
| 12230691 | Three dimensional device formation using early removal of sacrificial heterostructure layer | Yan Zhang, Johannes M. van Meer, Sankuei Lin, Baonian Guo | 2025-02-18 |
| 11948832 | Bottom implant and airgap isolation for nanosheet semiconductor devices | Yan Zhang, Johannes M. van Meer | 2024-04-02 |
| 11942361 | Semiconductor device cavity formation using directional deposition | Armin Saeedi Vahdat, Tristan Y. Ma, Johannes M. van Meer, John Hautala | 2024-03-26 |
| 11778832 | Wordline contact formation in NAND devices | Armin Saeedi Vahdat, Tristan Y. Ma, Johannes M. van Meer, John Hautala | 2023-10-03 |
| 11462546 | Dynamic random access device including two-dimensional array of fin structures | Sony Varghese | 2022-10-04 |
| 11217491 | Replacement gate formation with angled etch and deposition | Min Gyu Sung, Sony Varghese, Johannes M. van Meer, Jae-Young Lee | 2022-01-04 |
| 10971403 | Structure and method of forming fin device having improved fin liner | Min Gyu Sung, Sony Varghese, Johannes M. van Meer, Jae-Young Lee | 2021-04-06 |
| 10903211 | Gate devices and methods of formation using angled ions | Anthony Renau, Min Gyu Sung, Sony Varghese, Morgan Evans, Tassie Andersen | 2021-01-26 |
| 10720357 | Method of forming transistor device having fin cut regions | Min Gyu Sung, Sony Varghese, Johannes M. van Meer, Jae-Young Lee, Jun Seok Lee | 2020-07-21 |
| 10692775 | Fin damage reduction during punch through implantation of FinFET device | Min Gyu Sung, Jae-Young Lee, Johannes M. van Meer, Sony Varghese | 2020-06-23 |
| 10686033 | Fin damage reduction during punch through implantation of FinFET device | Min Gyu Sung, Jae-Young Lee, Johannes M. van Meer, Sony Varghese | 2020-06-16 |
| 10607999 | Techniques and structure for forming dynamic random access device | Sony Varghese | 2020-03-31 |
| 10510610 | Structure and method of forming fin device having improved fin liner | Min Gyu Sung, Sony Varghese, Johannes M. van Meer, Jae-Young Lee | 2019-12-17 |
| 10403552 | Replacement gate formation with angled etch and deposition | Min Gyu Sung, Sony Varghese, Johannes M. van Meer, Jae-Young Lee | 2019-09-03 |
| 9679776 | Masking for high temperature implants | Andrew Waite | 2017-06-13 |
| 9337314 | Technique for selectively processing three dimensional device | Nilay A. Pradhan, Benjamin Colombeau, Mandar B. Pandit, Christopher Dennis Bencher, Adam Brand | 2016-05-10 |
| 7544959 | In situ surface contamination removal for ion implanting | Steven R. Walther, Sandeep Mehta, Ukyo Jeong | 2009-06-09 |
| 7378335 | Plasma implantation of deuterium for passivation of semiconductor-device interfaces | Steven R. Walther, Ukyo Jeong, Sandeep Mehta | 2008-05-27 |
| 7326937 | Plasma ion implantation systems and methods using solid source of dopant material | Sandeep Mehta, Steven R. Walther | 2008-02-05 |