Issued Patents All Time
Showing 26–38 of 38 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8889566 | Low cost flowable dielectric films | Amit Chatterjee, Abhijit Basu Mallick, Nitin K. Ingle, Brian Saxton Underwood, Kiran V. Thadani +2 more | 2014-11-18 |
| 8741788 | Formation of silicon oxide using non-carbon flowable CVD processes | Nitin K. Ingle, Shankar Venkataraman | 2014-06-03 |
| 8647992 | Flowable dielectric using oxide liner | Nitin K. Ingle | 2014-02-11 |
| 8629067 | Dielectric film growth with radicals produced using flexible nitrogen/hydrogen ratio | Xiaolin Chen, Matthew L. Miller, Nitin K. Ingle, Shankar Venkataraman | 2014-01-14 |
| 8563445 | Conformal layers by radical-component CVD | Xiaolin Chen, Dongqing Li, Nitin K. Ingle | 2013-10-22 |
| 8551891 | Remote plasma burn-in | Lili Ji, Nitin K. Ingle | 2013-10-08 |
| 8466067 | Post-planarization densification | Nitin K. Ingle, Shankar Venkataraman | 2013-06-18 |
| 8449942 | Methods of curing non-carbon flowable CVD films | Sukwon Hong | 2013-05-28 |
| 8445078 | Low temperature silicon oxide conversion | Nitin K. Ingle, Sukwon Hong, Anjana M. Patel | 2013-05-21 |
| 8329587 | Post-planarization densification | Nitin K. Ingle, Shankar Venkataraman | 2012-12-11 |
| 8318584 | Oxide-rich liner layer for flowable CVD gapfill | Dongqing Li, Nitin K. Ingle | 2012-11-27 |
| 7935643 | Stress management for tensile films | Anjana M. Patel, Nitin K. Ingle, Shankar Venkataraman | 2011-05-03 |
| 7803722 | Methods for forming a dielectric layer within trenches | — | 2010-09-28 |