Issued Patents All Time
Showing 26–50 of 71 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9257638 | Method to etch non-volatile metal materials | Samantha Tan, Wenbing Yang, Meihua Shen, Richard Janek, Harmeet Singh +1 more | 2016-02-09 |
| 9153486 | CVD based metal/semiconductor OHMIC contact for high volume manufacturing applications | Reza Arghavani, Benjamin A. Bonner | 2015-10-06 |
| 9130158 | Method to etch non-volatile metal materials | Meihua Shen, Harmeet Singh, Samantha Tan, Thorsten Lill, Richard Janek +2 more | 2015-09-08 |
| 8545229 | Methods and apparatus for online auctions and market-places utilizing program terms | — | 2013-10-01 |
| 8251702 | Methods and apparatus for online auctions and market-places utilizing program terms | — | 2012-08-28 |
| 7720743 | Methods and apparatus for online auctions and market-places utilizing program terms | — | 2010-05-18 |
| 7429533 | Pitch reduction | Zhisong Huang, S. M. Reza Sadjadi | 2008-09-30 |
| 7405521 | Multiple frequency plasma processor method and apparatus | Raj Dhindsa, S. M. Reza Sadjadi, Felix Kozakevich, Dave Trussell, Lumin Li +5 more | 2008-07-29 |
| 7271107 | Reduction of feature critical dimensions using multiple masks | S. M. Reza Sadjadi | 2007-09-18 |
| 7114278 | Personalized picture frame assembly | Rose K. Marks | 2006-10-03 |
| 6908846 | Method and apparatus for detecting endpoint during plasma etching of thin films | Brian McMillin, Eric A. Hudson | 2005-06-21 |
| 6578757 | Photo mailer | John R. Espenshied | 2003-06-17 |
| 6545420 | Plasma reactor using inductive RF coupling, and processes | Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +6 more | 2003-04-08 |
| 6518195 | Plasma reactor using inductive RF coupling, and processes | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Peter Keswick, David W. Groechel +7 more | 2003-02-11 |
| 6488807 | Magnetic confinement in a plasma reactor having an RF bias electrode | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Peter Keswick, David W. Groechel +7 more | 2002-12-03 |
| 6444137 | Method for processing substrates using gaseous silicon scavenger | Kenneth S. Collins, Chan-Lon Yang, Jerry Wong, Peter Keswick, David W. Groechel | 2002-09-03 |
| 6440866 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2002-08-27 |
| 6399514 | High temperature silicon surface providing high selectivity in an oxide etch process | Jerry Wong, David W. Groechel, Peter Keswick, Chan-Lon Yang | 2002-06-04 |
| 6362110 | Enhanced resist strip in a dielectric etcher using downstream plasma | — | 2002-03-26 |
| 6280297 | Apparatus and method for distribution of slurry in a chemical mechanical polishing system | Robert D. Tolles, William L. Guthrie, Tsungnan Cheng | 2001-08-28 |
| 6251792 | Plasma etch processes | Kenneth S. Collins, Craig A. Roderick, John Trow, Chan-Lon Yang, Jerry Wong +7 more | 2001-06-26 |
| 6218312 | Plasma reactor with heated source of a polymer-hardening precursor material | Kenneth S. Collins, Michael R. Rice, David W. Groechel, Gerald Yin, Jon Mohn +5 more | 2001-04-17 |
| 6217785 | Scavenging fluorine in a planar inductively coupled plasma reactor | Kenneth S. Collins | 2001-04-17 |
| 6194325 | Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography | Chan-Lon Yang, Nicolas Bright, Kenneth S. Collins, David W. Groechel, Peter Keswick | 2001-02-27 |
| 6171974 | High selectivity oxide etch process for integrated circuit structures | Jerry Wong, David W. Groechel, Peter Keswick, Chan-Lon Yang | 2001-01-09 |