Issued Patents All Time
Showing 26–50 of 55 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11450532 | Deposition of self assembled monolayer for enabling selective deposition and etch | Younghee Lee, Daniel Peter, Yang Pan | 2022-09-20 |
| 11355353 | Tin oxide mandrels in patterning | Jengyi Yu, Seongjun Heo, Boris Volosskiy, Sivananda K. Kanakasabapathy, Richard Wise +2 more | 2022-06-07 |
| 11322351 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2022-05-03 |
| 11069535 | Atomic layer etch of tungsten for enhanced tungsten deposition fill | Chiukin Steven Lai, Keren Jacobs Kanarik, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more | 2021-07-20 |
| 11011379 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji, Jun Qian +1 more | 2021-05-18 |
| 10825680 | Directional deposition on patterned structures | Alexander Kabansky, Jeffrey Marks, Yang Pan | 2020-11-03 |
| 10763083 | High energy atomic layer etching | Wenbing Yang, Tamal Mukherjee, Keren Jacobs Kanarik, Yang Pan | 2020-09-01 |
| 10749103 | Dry plasma etch method to pattern MRAM stack | Taeseung Kim, Wenbing Yang, Jeffrey Marks, Thorsten Lill | 2020-08-18 |
| 10741405 | Selective self-aligned patterning of silicon germanium, germanium and type III/V materials using a sulfur-containing mask | Daniel Peter, Reza Arghavani, Yang Pan | 2020-08-11 |
| 10727073 | Atomic layer etching 3D structures: Si and SiGe and Ge smoothness on horizontal and vertical surfaces | Wenbing Yang, Keren Jacobs Kanarik, Thorsten Lill, Yang Pan | 2020-07-28 |
| 10685836 | Etching substrates using ALE and selective deposition | Jengyi Yu, Richard Wise, Nader Shamma, Yang Pan | 2020-06-16 |
| 10559468 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji, Jun Qian +1 more | 2020-02-11 |
| 10546748 | Tin oxide films in semiconductor device manufacturing | Jengyi Yu, Yu Jiang, Hui-Jung Wu, Richard Wise, Yang Pan +2 more | 2020-01-28 |
| 10515816 | Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Alexander Kabansky, Wenbing Yang +3 more | 2019-12-24 |
| 10374144 | Dry plasma etch method to pattern MRAM stack | Taeseung Kim, Wenbing Yang, Jeffrey Marks, Thorsten Lill | 2019-08-06 |
| 10304659 | Ale smoothness: in and outside semiconductor industry | Keren Jacobs Kanarik, Thorsten Lill, Meihua Shen, Yang Pan, Jeffrey Marks +1 more | 2019-05-28 |
| 10269566 | Etching substrates using ale and selective deposition | Jengyi Yu, Richard Wise, Nader Shamma, Yang Pan | 2019-04-23 |
| 10186426 | Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch) | Keren Jacobs Kanarik, Jeffrey Marks, Harmeet Singh, Alexander Kabansky, Wenbing Yang +3 more | 2019-01-22 |
| 10103056 | Methods for wet metal seed deposition for bottom up gapfill of features | Boris Volosskiy, Taeseung Kim, Praveen Nalla, Novy Tjokro, Artur Kolics | 2018-10-16 |
| 10096487 | Atomic layer etching of tungsten and other metals | Wenbing Yang, Keren Jacobs Kanarik, Jeffrey Marks, Taeseung Kim, Meihua Shen +1 more | 2018-10-09 |
| 10056264 | Atomic layer etching of GaN and other III-V materials | Wenbing Yang, Tomihito Ohba, Keren Jacobs Kanarik, Jeffrey Marks, Kazuo Nojiri | 2018-08-21 |
| 10043672 | Selective self-aligned patterning of silicon germanium, germanium and type III/V materials using a sulfur-containing mask | Daniel Peter, Reza Arghavani, Yang Pan | 2018-08-07 |
| 9997357 | Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors | Reza Arghavani, Bhadri N. Varadarajan, Adrien LaVoie, Ananda Banerji, Jun Qian +1 more | 2018-06-12 |
| 9984858 | ALE smoothness: in and outside semiconductor industry | Keren Jacobs Kanarik, Thorsten Lill, Meihua Shen, Yang Pan, Jeffrey Marks +1 more | 2018-05-29 |
| 9972504 | Atomic layer etching of tungsten for enhanced tungsten deposition fill | Chiukin Steven Lai, Keren Jacobs Kanarik, Anand Chandrashekar, Teh-Tien Su, Wenbing Yang +2 more | 2018-05-15 |