Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12276921 | Substrate comprising a target arrangement, and associated at least one patterning device, lithographic method and metrology method | Olger Victor Zwier, Maurits Van Der Schaar, Hilko Dirk Bos, Hans Van Der Laan, S. M. Masudur Rahman Al Arif +6 more | 2025-04-15 |
| 11320750 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Xing Lan Liu, Richard Johannes Franciscus Van Haren | 2022-05-03 |
| 11300887 | Method to change an etch parameter | Richard Johannes Franciscus Van Haren, Leon Paul VAN DIJK, Roy Werkman, Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg +4 more | 2022-04-12 |
| 11187995 | Metrology using a plurality of metrology target measurement recipes | Youping Zhang, Maurits Van Der Schaar, Richard Johannes Franciscus Van Haren, Xing Lan Liu | 2021-11-30 |
| 10788761 | Determining an optimal operational parameter setting of a metrology system | Leon Paul VAN DIJK, Xing Lan Liu, Richard Johannes Franciscus Van Haren | 2020-09-29 |
| 10474043 | Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method | Patrick Warnaar, Maurits Van Der Schaar, Grzegorz Grzela, Erik Johan Koop, Si-Han Zeng | 2019-11-12 |
| 10474045 | Lithographic apparatus and device manufacturing method | Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma +6 more | 2019-11-12 |
| 10162272 | Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method | Martin Jacobus Johan Jak, Hendrik Jan Hidde Smilde, Te-Chih Huang, Henricus Wilhelmus Maria Van Buel, Richard Johannes Franciscus Van Haren | 2018-12-25 |