Issued Patents All Time
Showing 51–75 of 91 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8625096 | Method and system for increasing alignment target contrast | Harry Sewell, Mircea Dusa, Manfred Gawein Tenner, Maya Angelova Doytcheva | 2014-01-07 |
| 8609441 | Substrate comprising a mark | Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken | 2013-12-17 |
| 8329366 | Apparatus and method for providing resist alignment marks in a double patterning lithographic process | Maya Angelova Doytcheva, Mircea Dusa, Harry Sewell, Robertus Wilhelmus Van Der Heijden | 2012-12-11 |
| 8319967 | Marker structure and method of forming the same | Sanjaysingh Lalbahadoersing, Sami Musa, Patrick Warnaar, Maya Angelova Doytcheva | 2012-11-27 |
| 8264664 | Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method | Maurits Van Der Schaar, Jacobus Burghoorn, Everhardus Cornelis Mos, Rene Monshouwer | 2012-09-11 |
| 8252491 | Method of forming a marker, substrate having a marker and device manufacturing method | Maurits Van Der Schaar | 2012-08-28 |
| 8203692 | Sub-segmented alignment mark arrangement | Sami Musa, Sanjaysingh Lalbahadoersing | 2012-06-19 |
| 8139217 | Alignment systems and methods for lithographic systems | Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2012-03-20 |
| 8115938 | Method of providing alignment marks, device manufacturing method and lithographic apparatus | — | 2012-02-14 |
| 8072615 | Alignment method, alignment system, and product with alignment mark | Sami Musa, Sanjaysingh Lalbahadoersing, Xiuhong Wei | 2011-12-06 |
| 8029953 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Maurits Van Der Schaar | 2011-10-04 |
| 7989303 | Method of creating an alignment mark on a substrate and substrate | — | 2011-08-02 |
| 7944063 | Application of 2-dimensional photonic crystals in alignment devices | Sami Musa | 2011-05-17 |
| 7916276 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Maurits Van Der Schaar | 2011-03-29 |
| 7897058 | Device manufacturing method and computer program product | Maurits Van Der Schaar, Ewoud Vreugdenhil, Harry Sewell | 2011-03-01 |
| 7880880 | Alignment systems and methods for lithographic systems | Franciscus Bernardus Maria Van Bilsen, Jacobus Burghoorn, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2011-02-01 |
| 7879682 | Marker structure and method for controlling alignment of layers of a multi-layered substrate | Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bart Rijpers | 2011-02-01 |
| 7863763 | Binary sinusoidal sub-wavelength gratings as alignment marks | Sami Musa | 2011-01-04 |
| 7821650 | Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement | Maurits Van Der Schaar, Arie Jeffrey Den Boef, Everhardus Cornelis Mos | 2010-10-26 |
| 7759029 | Substrate provided with an alignment mark in a substantially transmissive process layer, mask for exposing said mark, device manufacturing method, and device manufactured thereby | — | 2010-07-20 |
| 7737566 | Alignment devices and methods for providing phase depth control | Sami Musa | 2010-06-15 |
| 7687209 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Maurits Van Der Schaar | 2010-03-30 |
| 7629697 | Marker structure and method for controlling alignment of layers of a multi-layered substrate | Arie Jeffrey Den Boef, Jacobus Burghoorn, Maurits Van Der Schaar, Bartolomeus Petrus Rijpers | 2009-12-08 |
| 7619738 | Marker structure for optical alignment of a substrate, a substrate including such a marker structure, an alignment method for aligning to such a marker structure, and a lithographic projection apparatus | Paul Christiaan Hinnen, Sanjay Lalbahadoersing, Henry Megens, Maurits Van Der Schaar | 2009-11-17 |
| 7573574 | Lithographic apparatus and device manufacturing method | Paul Christiaan Hinnen, Hubertus Johannes Gertrudus Simons | 2009-08-11 |