Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11977034 | Methods and apparatus for measuring a property of a substrate | Wouter Lodewijk Elings, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more | 2024-05-07 |
| 10996176 | Methods and apparatus for measuring a property of a substrate | Wouter Lodewijk Elings, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more | 2021-05-04 |
| 10746668 | Methods and apparatus for measuring a property of a substrate | Wouter Lodewijk Elings, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more | 2020-08-18 |
| 10317191 | Methods and apparatus for measuring a property of a substrate | Wouter Lodewijk Elings, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more | 2019-06-11 |
| 9594029 | Methods and apparatus for measuring a property of a substrate | Wouter Lodewijk Elings, Christianus Gerardus Maria De Mol, Everhardus Cornelis Mos, Hoite Pieter Theodoor Tolsma, Peter Ten Berge +5 more | 2017-03-14 |
| 8345245 | Lithographic apparatus with multiple alignment arrangements and alignment measuring method | — | 2013-01-01 |
| 8139217 | Alignment systems and methods for lithographic systems | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2012-03-20 |
| 8018594 | Lithographic apparatus with multiple alignment arrangements and alignment measuring method | — | 2011-09-13 |
| 7894063 | Lithographic method | Everhardus Cornelis Mos | 2011-02-22 |
| 7880880 | Alignment systems and methods for lithographic systems | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2011-02-01 |
| 7763403 | Method and system for overlay control using dual metrology sampling | — | 2010-07-27 |
| 7651825 | Method and system for overlay control using dual metrology sampling | — | 2010-01-26 |
| 7626701 | Lithographic apparatus with multiple alignment arrangements and alignment measuring method | — | 2009-12-01 |
| 7439531 | Alignment systems and methods for lithographic systems | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2008-10-21 |
| 7414722 | Alignment measurement arrangement and alignment measurement method | — | 2008-08-19 |
| 7332732 | Alignment systems and methods for lithographic systems | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2008-02-19 |
| 7329888 | Alignment systems and methods for lithographic systems | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2008-02-12 |
| 7297971 | Alignment systems and methods for lithographic systems | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Paul Christiaan Hinnen, Hermanus Gerardus Van Horssen, Jeroen Huijbregtse +9 more | 2007-11-20 |
| 7271907 | Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement method | — | 2007-09-18 |
| 7042552 | Alignment strategy optimization method | Roy Werkman, Bart Swinnen | 2006-05-09 |
| 6893507 | Self-centering wafer support system | Matthew G. Goodman, Ivo Raaijmakers, Loren Jacobs, Michael J. Meyer, Eric Barrett | 2005-05-17 |
| 6708700 | Cleaning of semiconductor processing chambers | Ivo Raaijmakers | 2004-03-23 |
| 6666924 | Reaction chamber with decreased wall deposition | — | 2003-12-23 |
| 6564810 | Cleaning of semiconductor processing chambers | Ivo Raaijmakers | 2003-05-20 |
| 6454865 | Low mass wafer support system | Matthew G. Goodman, Ivo Raaijmakers, Loren Jacobs, Michael J. Meyer, Eric Barrett | 2002-09-24 |