GV

Geert Vandenberghe

AB Asml Netherlands B.V.: 1 patents #2,025 of 3,192Top 65%
📍 Wijgmaal, BE: #6 of 10 inventorsTop 60%
Overall (All Time): #3,372,941 of 4,157,543Top 85%
1
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Issued Patents All Time

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
7466413 Marker structure, mask pattern, alignment method and lithographic method and apparatus Jozef Maria Finders, Mircea Dusa, Richard Johannes Franciscus Van Haren, Luis Alberto Colina Santamaria Colina, Eric Henri Jan Hendrickx +1 more 2008-12-16