TD

Tamara Druzhinina

AB Asml Netherlands B.V.: 10 patents #458 of 3,192Top 15%
Overall (All Time): #483,031 of 4,157,543Top 15%
10
Patents All Time

Issued Patents All Time

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
12399428 Method and apparatus for forming a patterned layer of material Evgenia KURGANOVA, Gosse Charles De Vries, Alexey Olegovich POLYAKOV, Jim Vincent Overkamp, Teis Johan Coenen +2 more 2025-08-26
12325911 Method and apparatus for forming a patterned layer of material Jim Vincent Overkamp, Alexey Olegovich POLYAKOV, Teis Johan Coenen, Evgenia KURGANOVA, Ionel Mugurel Ciobica +4 more 2025-06-10
11875966 Method and apparatus for inspection Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul SMAKMAN +1 more 2024-01-16
11092902 Method and apparatus for detecting substrate surface variations Johannes F. M. D'Achard Van Enschut, Nitish Kumar, Sarathi ROY, Yang-Shan Huang, Arie Jeffrey Den Boef +3 more 2021-08-17
11094502 Method and apparatus for inspection Bernardo Kastrup, Johannes Catharinus Hubertus Mulkens, Marinus Aart Van Den Brink, Jozef Petrus Henricus Benschop, Erwin Paul SMAKMAN +1 more 2021-08-17
10712656 Method for manufacturing a membrane assembly Zomer Silvester HOUWELING, Eric Willem Felix Casimiri, Paul Janssen, Michael Alfred Josephus KUIJKEN, Martinus Hendrikus Antonius Leenders +8 more 2020-07-14
10551736 Methods for providing lithography features on a substrate by self-assembly of block copolymers Jozef Maria Finders, Emiel Peeters, Sander Frederik Wuister, Christianus Martinus Van Heesch, Eddy Cornelis Antonius Van Der Heijden +1 more 2020-02-04
10240250 Method to provide a patterned orientation template for a self-assemblable polymer Thanh Trung Nguyen, Jozef Maria Finders, Wilhelmus Sebastianus Marcus Maria Ketelaars, Sander Frederik Wuister, Eddy Cornelis Antonius Van Der Heijden +7 more 2019-03-26
10127336 Method of simulating formation of lithography features by self-assembly of block copolymers Sander Frederik Wuister, Jan Van Male, Joanne Klein-Wolterink, Davide Ambesi 2018-11-13
9368366 Methods for providing spaced lithography features on a substrate by self-assembly of block copolymers Sander Frederik Wuister, Mircea Dusa 2016-06-14