| 12429781 |
Metrology method and associated metrology and lithographic apparatuses |
— |
2025-09-30 |
| 12366809 |
Methods and apparatus for controlling a lithographic process |
Roy Werkman, David Deckers, Bijoy Rajasekharan, Ignacio Salvador Vazquez Rodarte |
2025-07-22 |
| 12306545 |
Determining lithographic matching performance |
Yingchao Cui, Hadi YAGUBIZADE, Xiuhong Wei, Daan Maurits Slotboom, Jeonghyun Park +3 more |
2025-05-20 |
| 12044979 |
Computational metrology based sampling scheme |
Wim Tjibbo Tel, Yichen Zhang |
2024-07-23 |
| 11994845 |
Determining a correction to a process |
Edo Maria Hulsebos, Roy Werkman, Junru RUAN |
2024-05-28 |
| 11635698 |
Computational metrology based sampling scheme |
Wim Tjibbo Tel, Yichen Zhang |
2023-04-25 |
| 11520238 |
Optimizing an apparatus for multi-stage processing of product units |
Jelle Nije, Alexander Ypma, Dimitra GKOROU, Georgios TSIROGIANNIS, Robert Jan Van Wijk +3 more |
2022-12-06 |
| 11448973 |
Computational metrology based correction and control |
Manouk RIJPSTRA, Cornelis Johannes Henricus LAMBREGTS, Wim Tjibbo Tel, Cédric Désiré Grouwstra, Chi-Fei NIEN +3 more |
2022-09-20 |
| 11281110 |
Methods using fingerprint and evolution analysis |
Jeroen VAN DONGEN, Wim Tjibbo Tel, Yichen Zhang, Andrea Cavalli, Bart Laurens Sjenitzer +1 more |
2022-03-22 |
| 11243470 |
Method and apparatus for deriving corrections, method and apparatus for determining a property of a structure, device manufacturing method |
Nitish Kumar, Adrianus Johannes Hendrikus Schellekens, Sietse Thijmen Van Der Post, Ferry Zijp, Willem Coene +2 more |
2022-02-08 |
| 11150562 |
Optimizing an apparatus for multi-stage processing of product units |
Jelle Nije, Alexander Ypma, Dimitra GKOROU, Georgios TSIROGIANNIS, Robert Jan Van Wijk +3 more |
2021-10-19 |
| 11092902 |
Method and apparatus for detecting substrate surface variations |
Johannes F. M. D'Achard Van Enschut, Tamara Druzhinina, Nitish Kumar, Yang-Shan Huang, Arie Jeffrey Den Boef +3 more |
2021-08-17 |
| 11086305 |
Determining a correction to a process |
Edo Maria Hulsebos, Roy Werkman, Junru RUAN |
2021-08-10 |