EH

Edo Maria Hulsebos

AB Asml Netherlands B.V.: 21 patents #189 of 3,192Top 6%
AN Asml Holding N.V.: 1 patents #312 of 520Top 60%
📍 Bergeijk, NL: #3 of 17 inventorsTop 20%
Overall (All Time): #201,550 of 4,157,543Top 5%
21
Patents All Time

Issued Patents All Time

Showing 1–21 of 21 patents

Patent #TitleCo-InventorsDate
12287583 Method for modeling measurement data over a substrate area and associated apparatuses 2025-04-29
12032305 Alignment method and associated alignment and lithographic apparatuses Franciscus Godefridus Casper Bijnen 2024-07-09
11994845 Determining a correction to a process Sarathi ROY, Roy Werkman, Junru RUAN 2024-05-28
11966166 Measurement apparatus and a method for determining a substrate grid Franciscus Godefridus Casper Bijnen, Henricus Johannes Lambertus Megens, Robert John Socha, Youping Zhang 2024-04-23
11927892 Alignment method and associated alignment and lithographic apparatuses Franciscus Godefridus Casper Bijnen 2024-03-12
11181836 Method for determining deformation Patricius Aloysius Jacobus Tinnemans, Franciscus Godefridus Casper Bijnen 2021-11-23
11086305 Determining a correction to a process Sarathi ROY, Roy Werkman, Junru RUAN 2021-08-10
11079684 Measurement apparatus and a method for determining a substrate grid Franciscus Godefridus Casper Bijnen, Henricus Johannes Lambertus Megens, Robert John Socha, Youping Zhang 2021-08-03
11029610 Lithographic method Patricius Aloysius Jacobus Tinnemans, Henricus Johannes Lambertus Megens, Ahmet Koray Erdamar, Loek Johannes Petrus Verhees, Willem Seine Christian Roelofs +11 more 2021-06-08
10962887 Lithographic method Patricius Aloysius Jacobus Tinnemans, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar +13 more 2021-03-30
10901326 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Patricius Aloysius Jacobus Tinnemans, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2021-01-26
10620549 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Patricius Aloysius Jacobus Tinnemans, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2020-04-14
10527958 Lithographic method Patricius Aloysius Jacobus Tinnemans, Henricus Johannes Lambertus Megens, Sudharshanan Raghunathan, Boris Menchtchikov, Ahmet Koray Erdamar +13 more 2020-01-07
10527957 Method and apparatus for processing a substrate in a lithographic apparatus Cayetano Sanchez-Fabres Cobaleda, Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Marcel Hendrikus Maria Beems, Piotr Michał Stolarz 2020-01-07
10514620 Alignment method Franciscus Godefridus Casper Bijnen, Simon Gijsbert Josephus Mathijssen, Vassili Demergis 2019-12-24
10474045 Lithographic apparatus and device manufacturing method Franciscus Godefridus Casper Bijnen, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Patricius Aloysius Jacobus Tinnemans, Alexander Ypma +6 more 2019-11-12
10331040 Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus Patricius Aloysius Jacobus Tinnemans, Ralph Brinkhof, Pieter Jacob Heres, Jorn Kjeld Lucas, Loek Johannes Petrus Verhees +2 more 2019-06-25
10139740 Lithographic apparatus and device manufacturing method Franciscus Godefridus Casper Bijnen 2018-11-27
9665012 Lithographic apparatus and device manufacturing method 2017-05-30
8208140 Alignment system and alignment marks for use therewith Franciscus Godefridus Casper Bijnen, Patrick Warnaar 2012-06-26
8208139 Alignment system and alignment marks for use therewith Franciscus Godefridus Casper Bijnen, Patrick Warnaar 2012-06-26