Issued Patents All Time
Showing 26–50 of 124 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11092900 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2021-08-17 |
| 11003099 | Method and apparatus for design of a metrology target | Murat Bozkurt, Patrick Warnaar, Stefan Cornelis Theodorus Van Der Sanden | 2021-05-11 |
| 10996570 | Metrology method, patterning device, apparatus and computer program | Zili Zhou, Nitesh Pandey, Olger Victor Zwier, Patrick Warnaar, Elliott Gerard McNamara +6 more | 2021-05-04 |
| 10955353 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2021-03-23 |
| 10859923 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Gonzalo Roberto Sanguinetti, Murat Bozkurt, Arie Jeffrey Den Boef | 2020-12-08 |
| 10802408 | Method for optimization of a lithographic process | Everhardus Cornelis Mos, Jochem Sebastiaan Wildenberg, Erik Johannes Maria Wallerbos, Frank Staals, Franciscus Hendricus Arnoldus Elich | 2020-10-13 |
| 10802409 | Metrology method and apparatus, substrate, lithographic method and associated computer product | Chi-Hsiang Fan, Youping Zhang | 2020-10-13 |
| 10794693 | Metrology method, apparatus and computer program | Farzad Farhadzadeh, Mohammadreza Hajiahmadi, Murat Bozkurt | 2020-10-06 |
| 10725386 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Markus Gerardus Martinus Maria Van Kraaij | 2020-07-28 |
| 10718604 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more | 2020-07-21 |
| 10585357 | Alternative target design for metrology using modulation techniques | Youping Zhang, Hua XU | 2020-03-10 |
| 10578980 | Method of determining a position of a feature | Ralph Timotheus Huijgen, Marc Jurian Kea, Marcel Theodorus Maria Van Kessel, Masashi Ishibashi, Chi-Hsiang Fan +3 more | 2020-03-03 |
| 10564552 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Gonzalo Roberto Sanguinetti, Murat Bozkurt, Arie Jeffrey Den Boef | 2020-02-18 |
| 10481506 | Method of measuring a structure, inspection apparatus, lithographic system and device manufacturing method | Murat Bozkurt, Patrick Warnaar, Martin Jacobus Johan Jak, Mohammadreza Hajiahmadi, Grzegorz Grzela +1 more | 2019-11-19 |
| 10481503 | Method and apparatus for measuring a parameter of a lithographic process, substrate and patterning devices for use in the method | Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma +3 more | 2019-11-19 |
| 10474039 | Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method | Paul Christiaan Hinnen, Simon Gijsbert Josephus Mathijssen, Maikel Robert GOOSEN, Arie Jeffrey Den Boef | 2019-11-12 |
| 10474043 | Method of measuring a property of a substrate, inspection apparatus, lithographic system and device manufacturing method | Patrick Warnaar, Grzegorz Grzela, Erik Johan Koop, Victor Emanuel Calado, Si-Han Zeng | 2019-11-12 |
| 10437163 | Method and apparatus for design of a metrology target | Murat Bozkurt, Patrick Warnaar, Stefan Cornelis Theodorus Van Der Sanden | 2019-10-08 |
| 10386176 | Metrology method, target and substrate | Kaustuve Bhattacharyya, Henricus Wilhelmus Maria Van Buel, Christophe David Fouquet, Hendrik Jan Hidde Smilde, Arie Jeffrey Den Boef +7 more | 2019-08-20 |
| 10331041 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Markus Gerardus Martinus Maria Van Kraaij | 2019-06-25 |
| 10241055 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2019-03-26 |
| 10180628 | Method of determining critical-dimension-related properties, inspection apparatus and device manufacturing method | Hugo Augustinus Joseph Cramer, Arie Jeffrey Den Boef, Henricus Johannes Lambertus Megens, Te-Chih Huang | 2019-01-15 |
| 10156797 | Method of determining edge placement error, inspection apparatus, patterning device, substrate and device manufacturing method | Seyed Iman Mossavat, Hugo Augustinus Joseph Cramer | 2018-12-18 |
| 10126662 | Metrology method and apparatus, lithographic system and device manufacturing method | Scott Anderson Middlebrooks, Niels Geypen, Hendrik Jan Hidde Smilde, Alexander Straaijer, Markus Gerardus Martinus Maria Van Kraaij | 2018-11-13 |
| 10073357 | Measuring a process parameter for a manufacturing process involving lithography | Arie Jeffrey Den Boef, Omer Abubaker Omer Adam, Te-Chih Huang, Youping Zhang | 2018-09-11 |