Issued Patents All Time
Showing 76–100 of 124 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8553230 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2013-10-08 |
| 8363220 | Method of determining overlay error and a device manufacturing method | Willem Marie Julia Marcel Coene, Karel Diederick Van Der Mast | 2013-01-29 |
| 8264686 | Lithographic apparatus and device manufacturing method using overlay measurement | Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2012-09-11 |
| 8264664 | Method for producing a marker on a substrate, lithographic apparatus and device manufacturing method | Jacobus Burghoorn, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos, Rene Monshouwer | 2012-09-11 |
| 8252491 | Method of forming a marker, substrate having a marker and device manufacturing method | Richard Johannes Franciscus Van Haren | 2012-08-28 |
| 8248579 | Lithographic apparatus, device manufacturing method and device for correcting overlay errors between overlapping patterns | Everhardus Cornelis Mos, Hubertus Johannes Gertrudus Simons | 2012-08-21 |
| 8237914 | Process, apparatus, and device for determining intra-field correction to correct overlay errors between overlapping patterns | Everhardus Cornelis Mos, Hubertus Johannes Gertrudus Simons | 2012-08-07 |
| 8111398 | Method of measurement, an inspection apparatus and a lithographic apparatus | Arie Jeffrey Den Boef, Everhardus Cornelis Mos | 2012-02-07 |
| 8064056 | Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2011-11-22 |
| 8054467 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2011-11-08 |
| 8029953 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Richard Johannes Franciscus Van Haren | 2011-10-04 |
| 7969577 | Inspection apparatus, an apparatus for projecting an image and a method of measuring a property of a substrate | Roy Werkman, Everhardus Cornelis Mos | 2011-06-28 |
| 7916276 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Richard Johannes Franciscus Van Haren | 2011-03-29 |
| 7911612 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Antoine Gaston Marie Kiers, Arie Jeffrey Den Boef | 2011-03-22 |
| 7898662 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Everhardus Cornelis Mos, Stefan Carolus Jacobus Antonius Keij | 2011-03-01 |
| 7897058 | Device manufacturing method and computer program product | Richard Johannes Franciscus Van Haren, Ewoud Vreugdenhil, Harry Sewell | 2011-03-01 |
| 7879682 | Marker structure and method for controlling alignment of layers of a multi-layered substrate | Richard Johannes Franciscus Van Haren, Arie Jeffrey Den Boef, Jacobus Burghoorn, Bart Rijpers | 2011-02-01 |
| 7821650 | Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement | Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos | 2010-10-26 |
| 7791727 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Mircea Dusa, Antoine Gaston Marie Kiers | 2010-09-07 |
| 7791732 | Method and apparatus for angular-resolved spectroscopic lithography characterization | Arie Jeffrey Den Boef, Arno Jan Bleeker, Youri Johannes Laurentius Maria Van Dommelen, Mircea Dusa, Antoine Gaston Marie Kiers +4 more | 2010-09-07 |
| 7724370 | Method of inspection, a method of manufacturing, an inspection apparatus, a substrate, a mask, a lithography apparatus and a lithographic cell | Everhardus Cornelis Mos, Arie Jeffrey Den Boef | 2010-05-25 |
| 7710572 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Everhardus Cornelis Mos, Arie Jeffrey Den Boef, Thomas Leo Maria Hoogenboom | 2010-05-04 |
| 7687209 | Lithographic apparatus and device manufacturing method with double exposure overlay control | Richard Johannes Franciscus Van Haren | 2010-03-30 |
| 7683351 | Lithographic apparatus and device manufacturing method | Everhardus Cornelis Mos, Hubertus Johannes Gertrudus Simons | 2010-03-23 |
| 7656518 | Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus | Arie Jeffrey Den Boef, Karel Diederick Van Der Mast | 2010-02-02 |