Issued Patents All Time
Showing 1–25 of 30 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11537055 | Lithographic apparatus, metrology apparatus, optical system and method | — | 2022-12-27 |
| 11126007 | Beam splitting prism systems | Douglas C. CAPPELLI, Richard Carl Zimmerman, Joshua Adams, Alexander K. Raub, Yevgeniy Konstantinovich Shmarev | 2021-09-21 |
| 10852247 | Variable corrector of a wave front | Johannes Matheus Marie De Wit, Teunis Willem Tukker, Armand Eugene Albert Koolen | 2020-12-01 |
| 10747010 | Beam splitting prism systems | Douglas C. CAPPELLI, Richard Carl Zimmerman, Joshua Adams, Alexander K. Raub, Yevgeniy Konstantinovich Shmarev | 2020-08-18 |
| 10724961 | Method and device for focusing in an inspection system | Yevgeniy Konstantinovich Shmarev | 2020-07-28 |
| 10495889 | Beam homogenizer, illumination system and metrology system | Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit | 2019-12-03 |
| 10107761 | Method and device for focusing in an inspection system | Yevgeniy Konstantinovich Shmarev, Chien-Hung Tseng, Armand Eugene Albert Koolen | 2018-10-23 |
| 10048591 | Catadioptric illumination system for metrology | Yevgeniy Konstantinovich Shmarev | 2018-08-14 |
| 9904173 | Method and apparatuses for optical pupil symmetrization | Yevgeniy Konstantinovich Shmarev | 2018-02-27 |
| 9285687 | Inspection apparatus, lithographic apparatus, and device manufacturing method | Lev Ryzhikov, Eric Brian Catey, Adel Joobeur, David Heald, Yevgeniy Konstantinovich Shmarev +1 more | 2016-03-15 |
| 9069260 | Catadioptric illumination system for metrology | Yevgeniy Konstantinovich Shmarev | 2015-06-30 |
| 8982481 | Catadioptric objective for scatterometry | Adel Joobeur, Yevgeniy Konstantinovich Shmarev, Arun Mahadevan Venkataraman | 2015-03-17 |
| 8634064 | Optical system for increasing illumination efficiency of a patterning device by producing a plurality of beams | — | 2014-01-21 |
| 8259398 | High numerical aperture catadioptric objectives without obscuration and applications thereof | Eric Brian Catey, Adel Joobeur | 2012-09-04 |
| 8107173 | Catadioptric optical system for scatterometry | Yevgeniy Konstanitinovich Shmarev, Irina I. Pozhinskaya | 2012-01-31 |
| 8064148 | High numerical aperture catadioptric objectives without obscuration and applications thereof | Eric Brian Catey, Adel Joobeur | 2011-11-22 |
| 7965378 | Optical system and method for illumination of reflective spatial light modulators in maskless lithography | Kirill Y. Sobolev | 2011-06-21 |
| 7859647 | Lithographic apparatus and device manufacturing method | Arno Jan Bleeker, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Christian Wagner, Lev Ryzhikov +1 more | 2010-12-28 |
| 7852459 | Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method | Arie Jeffrey Den Boef, Adel Joobeur | 2010-12-14 |
| 7839487 | Optical system for increasing illumination efficiency of a patterning device | — | 2010-11-23 |
| 7834979 | Off-axis catadioptric projection optical system for lithography | Mark Oskotsky | 2010-11-16 |
| 7826142 | Method for improved optical design using deterministically defined surfaces | Nora-Jean Harned, Richard Gontin, Robert D. Harned, Azat Latypov | 2010-11-02 |
| 7633689 | Catadioptric optical system for scatterometry | Yevgeniy Konstantinovich Shmarev, Irina I. Pozhinskaya | 2009-12-15 |
| 7511798 | Off-axis catadioptric projection optical system for lithography | Mark Oskotsky | 2009-03-31 |
| 7317583 | High numerical aperture projection system and method for microlithography | Mark Oskotsky | 2008-01-08 |