Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10928738 | Adaptive filter for in-line correction | Igor Matheus Petronella Aarts, Robert Anthony Augelli, Sergey MALYK | 2021-02-23 |
| 10895813 | Lithographic cluster, lithographic apparatus, and device manufacturing method | Irit Tzemah, John D. Connelly | 2021-01-19 |
| 10481507 | Measurement method comprising in-situ printing of apparatus mark and corresponding apparatus | Kevin J. Violette, Igor Matheus Petronella Aarts, Haico Victor Kok | 2019-11-19 |
| 9285687 | Inspection apparatus, lithographic apparatus, and device manufacturing method | Stanislav Smirnov, Lev Ryzhikov, Adel Joobeur, David Heald, Yevgeniy Konstantinovich Shmarev +1 more | 2016-03-15 |
| 9046754 | EUV mask inspection system | Harry Sewell, Adel Joobeur, Yevgeniy Konstantinovich Shmarev | 2015-06-02 |
| 9041903 | Mask inspection with fourier filtering and image compare | Michael L. Nelson, Harry Sewell | 2015-05-26 |
| 8623576 | Time differential reticle inspection | Nora-Jean Harned, Yevgeniy Konstantinovich Shmarev, Robert Albert Tharaldsen, Richard David Jacobs | 2014-01-07 |
| 8259398 | High numerical aperture catadioptric objectives without obscuration and applications thereof | Stanislav Smirnov, Adel Joobeur | 2012-09-04 |
| 8189203 | Reticle inspection systems and method | Yevgeniy Konstantinovich Shmarev, Robert Albert Tharaldsen, Richard David Jacobs | 2012-05-29 |
| 8064148 | High numerical aperture catadioptric objectives without obscuration and applications thereof | Stanislav Smirnov, Adel Joobeur | 2011-11-22 |
| 7525641 | System and method for uniformity correction | Richard Carl Zimmerman, David A. Hult, Alexander Kremer, Heine Melle Mulder, Hendrikus Robertus Marie Van Greevenbroek +1 more | 2009-04-28 |
| 6239863 | Removable cover for protecting a reticle, system including and method of using the same | David A. Hult, Santiago del Puerto, Stephen Roux | 2001-05-29 |