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Broad spectrum radiation by supercontinuum generation using a tapered optical fiber |
King Pui Leung, Tao Chen, Ronan James Havelin, Igor Matheus Petronella AARTS, Joseph Carbone |
2023-12-05 |
| 10802208 |
Broad spectrum radiation by supercontinuum generation using a tapered optical fiber |
King Pui Leung, Tao Chen, Ronan James Havelin, Igor Matheus Petronella Aarts, Joseph Carbone |
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Inspection apparatus, lithographic apparatus, and device manufacturing method |
Stanislav Smirnov, Lev Ryzhikov, Eric Brian Catey, David Heald, Yevgeniy Konstantinovich Shmarev +1 more |
2016-03-15 |
| 9046754 |
EUV mask inspection system |
Harry Sewell, Eric Brian Catey, Yevgeniy Konstantinovich Shmarev |
2015-06-02 |
| 8982481 |
Catadioptric objective for scatterometry |
Stanislav Smirnov, Yevgeniy Konstantinovich Shmarev, Arun Mahadevan Venkataraman |
2015-03-17 |
| 8625199 |
Pulse modifier with adjustable etendue |
Oscar Franciscus Jozephus Noordman, Paul Van Der Veen, Arun Mahadevan Venkataraman |
2014-01-07 |
| 8259398 |
High numerical aperture catadioptric objectives without obscuration and applications thereof |
Stanislav Smirnov, Eric Brian Catey |
2012-09-04 |
| 8164740 |
Illumination system coherence remover with two sets of stepped mirrors |
Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Scott Coston, Rob Vink +1 more |
2012-04-24 |
| 8159651 |
Illumination system coherence remover with a series of partially reflective surfaces |
Huibert Visser, Jacob Klinkhamer, Lev Ryzhikov, Scott Coston, Rob Vink +1 more |
2012-04-17 |
| 8064148 |
High numerical aperture catadioptric objectives without obscuration and applications thereof |
Stanislav Smirnov, Eric Brian Catey |
2011-11-22 |
| 8004770 |
Pulse modifier with adjustable etendue |
Oscar Franciscus Jozephus Noordman, Paul Van Der Veen, Arun Mahadevan Venkataraman |
2011-08-23 |
| 7852459 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
Arie Jeffrey Den Boef, Stanislav Smirnov |
2010-12-14 |
| 7432517 |
Pulse modifier, lithographic apparatus, and device manufacturing method |
Hako Botma, Joerg Bruebach, Mark Trentelman |
2008-10-07 |