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Metrology tool with position control of projection system |
Hans Butler, Arie Jeffrey Den Boef, Mark Constant Johannes Baggen, Jeroen Arnoldus Leonardus Johannes Raaymakers |
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| 11126007 |
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Douglas C. CAPPELLI, Stanislav Smirnov, Joshua Adams, Alexander K. Raub, Yevgeniy Konstantinovich Shmarev |
2021-09-21 |
| 10809193 |
Inspection apparatus having non-linear optics |
Marinus Johannes Maria Van Dam |
2020-10-20 |
| 10747010 |
Beam splitting prism systems |
Douglas C. CAPPELLI, Stanislav Smirnov, Joshua Adams, Alexander K. Raub, Yevgeniy Konstantinovich Shmarev |
2020-08-18 |
| 9134620 |
Double EUV illumination uniformity correction system and method |
— |
2015-09-15 |
| 9075324 |
Beam positioning and pointing |
Roberto B. Wiener |
2015-07-07 |
| 8629973 |
Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation |
Hendrikus Robertus Marie Van Greevenbroek, Peter Kochersperger, Todd R. Downey, Elizabeth Stone, Szilard Istvan Csiszar +2 more |
2014-01-14 |
| 8009269 |
Optimal rasterization for maskless lithography |
Kars Zeger Troost, Jason Hintersteiner, Minne Cuperus, Kamen Hristov Chilov, Ronnie Florentius Van T Westeinde |
2011-08-30 |
| 7525641 |
System and method for uniformity correction |
Eric Brian Catey, David A. Hult, Alexander Kremer, Heine Melle Mulder, Hendrikus Robertus Marie Van Greevenbroek +1 more |
2009-04-28 |
| 7333176 |
De-focus uniformity correction |
Roberto B. Wiener, Alexander Kremer, Elizabeth Stone |
2008-02-19 |
| 7173688 |
Method for calculating an intensity integral for use in lithography systems |
Roberto B. Wiener, Alexander Kremer, Elizabeth Stone |
2007-02-06 |