Issued Patents All Time
Showing 25 most recent of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12405227 | Method for region of interest processing for reticle particle detection | Christopher Michael DOHAN, Justin Kreuzer, Michal Emanuel Pawlowski, Aage Bendiksen, Kirill Urievich SOBOLEV +3 more | 2025-09-02 |
| 12189312 | Reticle gripper damper and isolation system for lithographic apparatuses | Roberto B. Wiener, Boris Kogan, Martinus Agnes Willem Cuijpers, Robert Wade, Shaun Evans | 2025-01-07 |
| 11333984 | Apparatus for and method of in-situ particle removal in a lithography apparatus | Richard Joseph Bruls, Ronald Peter Albright, Victor Antonio PEREZ-FALCON | 2022-05-17 |
| 11137694 | Particle suppression systems and methods | Yang-Shan Huang, Marcel Joseph Louis Boonen, Han-Kwang Nienhuys, Jacob Brinkert, Richard Joseph Bruls | 2021-10-05 |
| 10209635 | Lithographic apparatus with a patterning device environment | David Ramirez | 2019-02-19 |
| 9669984 | Lithographic apparatus and device manufacturing method | Robert Gabriël Maria Lansbergen, David Ramirez | 2017-06-06 |
| 9457947 | Lithographic apparatus and device manufacturing method | Robert Gabriël Maria Lansbergen, David Ramirez, Xugang Xiong, George Hilary Harrold, Arindam Sinharoy | 2016-10-04 |
| 9083227 | Linear motor and lithography arrangement including linear motor | — | 2015-07-14 |
| 8629973 | Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation | Richard Carl Zimmerman, Hendrikus Robertus Marie Van Greevenbroek, Todd R. Downey, Elizabeth Stone, Szilard Istvan Csiszar +2 more | 2014-01-14 |
| 8159647 | Lithographic apparatus and device manufacturing method | Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Kars Zeger Troost | 2012-04-17 |
| 7999939 | Real time telecentricity measurement | Roberto B. Wiener | 2011-08-16 |
| 7786607 | Overlay correction by reducing wafer slipping after alignment | — | 2010-08-31 |
| 7751130 | Optical element damping systems | Stephen Roux, Justin Kreuzer | 2010-07-06 |
| 7549321 | Pressure sensor | Joseph H. Lyons, James H. Walsh, Rajan Mali | 2009-06-23 |
| 7542263 | Overlay correction by reducing wafer slipping after alignment | — | 2009-06-02 |
| 7500380 | Measuring distance using gas gauge proximity sensor | Frederick Carter | 2009-03-10 |
| 7472580 | Pressure sensor | Joseph H. Lyons, James H. Walsh, Rajan Mali | 2009-01-06 |
| 7414701 | Method and systems for total focus deviation adjustments on maskless lithography systems | — | 2008-08-19 |
| 7411652 | Lithographic apparatus and device manufacturing method | Arno Jan Bleeker, Dominicus Jacobus Petrus Adrianus Franken, Kars Zeger Troost | 2008-08-12 |
| 7278817 | Method for transferring and loading a reticle | Glenn Friedman, Joseph Laganza | 2007-10-09 |
| 7164463 | Lithographic tool with dual isolation system and method for configuring the same | Daniel N. Galburt | 2007-01-16 |
| 7158213 | Lithographic tool with dual isolation system and method for configuring the same | Daniel N. Galburt | 2007-01-02 |
| 7021120 | High resolution gas gauge proximity sensor | Frederick Carter | 2006-04-04 |
| 7004715 | Apparatus for transferring and loading a reticle with a robotic reticle end-effector | Glenn Friedman, Joseph Laganza | 2006-02-28 |
| 6978658 | Proximity sensor with self compensation for mechanism instability | — | 2005-12-27 |