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Method and system for determining overlay |
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2013-02-26 |
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2012-09-11 |
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Lithographic apparatus, device manufacturing method and method of calibrating a lithographic apparatus |
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2010-06-29 |
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Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate |
Boris Menchtchikov |
2010-05-04 |
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Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
Boris Menchtchikov |
2010-05-04 |
| 7462429 |
Method and arrangement for correcting thermally-induced field deformations of a lithographically exposed substrate |
Boris Menchtchikov |
2008-12-09 |
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Method and arrangement for predicting thermally-induced deformation of a substrate, and a semiconductor device |
Boris Menchtchikov |
2008-12-09 |
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Method of calibrating a lithographic apparatus and device manufacturing method |
Koen Jacobus Johannes Maria Zaal, Antonius Johannes De Kort, Koen Goorman, Boris Menchtchikov, Hermen Folken Pen |
2008-09-16 |
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2008-09-09 |
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Lithographic apparatus and device manufacturing method |
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2007-03-27 |