Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12339591 | Determining metrics for a portion of a pattern on a substrate | Jiao Huang, Yunan ZHENG, Qian Zhao, Jiao LIANG, Mu FENG | 2025-06-24 |
| 11675274 | Etch bias characterization and method of using the same | Leiwu ZHENG, Mu FENG, Qian Zhao, Jen-Shiang Wang | 2023-06-13 |
| 8918743 | Edge-based full chip mask topography modeling | Qiliang Yan, Hongbo Zhang, Ebo Croffie, Lin Zhang, Peter Brooker +1 more | 2014-12-23 |
| 8875066 | Performing image calculation based on spatial coherence | Thomas Schmoeller | 2014-10-28 |
| 8812145 | Modeling mask errors using aerial image sensitivity | Jensheng Huang | 2014-08-19 |
| 8355807 | Method and apparatus for using aerial image sensitivity to model mask errors | Jensheng Huang | 2013-01-15 |
| 8296688 | Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance field | Levi D. Barnes, Benjamin D. Painter, Qiliang Yan, Jianliang Li, Amyn A. Poonawala | 2012-10-23 |
| 8161424 | Method and apparatus for modeling chemically amplified resists | — | 2012-04-17 |
| 8006203 | Bulk image modeling for optical proximity correction | Qiaolin Zhang, Bradley J. Falch | 2011-08-23 |
| 7954071 | Assist feature placement based on a focus-sensitive cost-covariance field | Levi D. Barnes, Benjamin D. Painter, Qiliang Yan, Jianliang Li, Amyn A. Poonawala | 2011-05-31 |