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Lithography improvement based on defect probability distributions and critical dimension variations |
Lawrence S. Melvin, III, Yudhishthir Prasad Kandel, Ulrich Klostermann |
2022-04-26 |
| 10691015 |
Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks |
Hongbo Zhang |
2020-06-23 |
| 10635776 |
Producing mask layouts with rounded corners |
— |
2020-04-28 |
| 9354511 |
Integrated mask-aware lithography modeling to support off-axis illumination and multi-tone masks |
Hongbo Zhang |
2016-05-31 |
| 9348964 |
MASK3D model accuracy enhancement for small feature coupling effect |
Hongbo Zhang |
2016-05-24 |
| 8972229 |
Fast 3D mask model based on implicit countors |
Zhijie Deng, James P. Shiely |
2015-03-03 |
| 8918743 |
Edge-based full chip mask topography modeling |
Hongbo Zhang, Ebo Croffie, Lin Zhang, Yongfa Fan, Peter Brooker +1 more |
2014-12-23 |
| 8719736 |
Compact and accurate wafer topography proximity effect modeling for full chip simulation |
Hongbo Zhang, Nikolay Voznesenskiy, Ebo Croffie |
2014-05-06 |
| 8296688 |
Evaluating the quality of an assist feature placement based on a focus-sensitive cost-covariance field |
Levi D. Barnes, Benjamin D. Painter, Yongfa Fan, Jianliang Li, Amyn A. Poonawala |
2012-10-23 |
| 8184897 |
Method and apparatus for determining an optical threshold and a resist bias |
Jianliang Li, Lawrence S. Melvin, III |
2012-05-22 |
| 7954071 |
Assist feature placement based on a focus-sensitive cost-covariance field |
Levi D. Barnes, Benjamin D. Painter, Yongfa Fan, Jianliang Li, Amyn A. Poonawala |
2011-05-31 |
| 7933471 |
Method and system for correlating physical model representation to pattern layout |
Jianliang Li, Lawrence S. Melvin, III, James P. Shiely |
2011-04-26 |
| 7784018 |
Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model |
Lawrence S. Melvin, III, James P. Shiely |
2010-08-24 |
| 7739645 |
Method and apparatus for determining a process model using a 2-D-pattern detecting kernel |
Jianliang Li, Lawrence S. Melvin, III |
2010-06-15 |
| 7721246 |
Method and apparatus for quickly determining the effect of placing an assist feature at a location in a layout |
Jianliang Li, Lawrence S. Melvin, III, Levi D. Barnes, Abani M. Biswas |
2010-05-18 |
| 7681172 |
Method and apparatus for modeling an apodization effect in an optical lithography system |
Qiaolin Zhang, Paul VanAdrichem, Laurent Michel Marcel Depre |
2010-03-16 |
| 7496880 |
Method and apparatus for assessing the quality of a process model |
Lawrence S. Melvin, III |
2009-02-24 |
| 7320119 |
Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model |
Lawrence S. Melvin, III, James P. Shiely, Benjamin D. Painter |
2008-01-15 |
| 7308673 |
Method and apparatus for correcting 3D mask effects |
Lawrence S. Melvin, III, James P. Shiely |
2007-12-11 |
| 7243332 |
Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model |
Lawrence S. Melvin, III, James P. Shiely |
2007-07-10 |