| 11200362 |
3D resist profile aware resolution enhancement techniques |
Hua Song, Cheng-En Wu |
2021-12-14 |
| 9646127 |
3D resist profile aware etch-bias model |
Hua Song, Cheng-En Wu |
2017-05-09 |
| 9484186 |
Modeling and correcting short-range and long-range effects in E-beam lithography |
Hua Song, Irene Y. Su |
2016-11-01 |
| 8972229 |
Fast 3D mask model based on implicit countors |
Zhijie Deng, Qiliang Yan |
2015-03-03 |
| 8826193 |
Detection and removal of self-aligned double patterning artifacts |
Yuelin Du, Gerard Luk-Pat, Alexander Miloslavsky, Benjamin D. Painter, Hua Song |
2014-09-02 |
| 8689149 |
Multi-patterning for sharp corner printing |
Yuelin Du, Hua Song |
2014-04-01 |
| 8601404 |
Modeling EUV lithography shadowing effect |
Hua Song, Lena Zavyalova |
2013-12-03 |
| 8443308 |
EUV lithography flare calculation and compensation |
Hua Song |
2013-05-14 |
| 8423917 |
Modeling thin-film stack topography effect on a photolithography process |
Hua Song, Qiaolin Zhang |
2013-04-16 |
| 8291353 |
Non-linear rasterized contour filters |
Zhijie Deng |
2012-10-16 |
| 8132128 |
Method and system for performing lithography verification for a double-patterning process |
Hua Song, Lantian Wang, Gerard Luk-Pat |
2012-03-06 |
| 7933471 |
Method and system for correlating physical model representation to pattern layout |
Jianliang Li, Qiliang Yan, Lawrence S. Melvin, III |
2011-04-26 |
| 7784018 |
Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model |
Lawrence S. Melvin, III, Qiliang Yan |
2010-08-24 |
| 7494751 |
Method and apparatus for improving depth of focus during optical lithography |
Lawrence S. Melvin, III |
2009-02-24 |
| 7320119 |
Method and apparatus for identifying a problem edge in a mask layout using an edge-detecting process-sensitivity model |
Lawrence S. Melvin, III, Qiliang Yan, Benjamin D. Painter |
2008-01-15 |
| 7308673 |
Method and apparatus for correcting 3D mask effects |
Lawrence S. Melvin, III, Qiliang Yan |
2007-12-11 |
| 7251807 |
Method and apparatus for identifying a manufacturing problem area in a layout using a process-sensitivity model |
Lawrence S. Melvin, III |
2007-07-31 |
| 7243332 |
Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model |
Lawrence S. Melvin, III, Qiliang Yan |
2007-07-10 |