Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8826193 | Detection and removal of self-aligned double patterning artifacts | Yuelin Du, Alexander Miloslavsky, Benjamin D. Painter, James P. Shiely, Hua Song | 2014-09-02 |
| 8132128 | Method and system for performing lithography verification for a double-patterning process | Hua Song, Lantian Wang, James P. Shiely | 2012-03-06 |
| 7483559 | Method and apparatus for deblurring mask images | Fang-Cheng Chang | 2009-01-27 |
| 7478360 | Approximating wafer intensity change to provide fast mask defect scoring | Raghava Kondepudy | 2009-01-13 |