| 7653890 |
Modeling resolution enhancement processes in integrated circuit fabrication |
Chi-Ming Tsai, Lai Chee Man, Yao-Ting Wang |
2010-01-26 |
| 7617474 |
System and method for providing defect printability analysis of photolithographic masks with job-based automation |
Linyong Pang |
2009-11-10 |
| 7523027 |
Visual inspection and verification system |
Yao-Ting Wang, Yagyensh C. Pati, Linard Karklin |
2009-04-21 |
| 7483559 |
Method and apparatus for deblurring mask images |
Gerard Luk-Pat |
2009-01-27 |
| 7457736 |
Automated creation of metrology recipes |
— |
2008-11-25 |
| 7360191 |
Delta information design closure integrated circuit fabrication |
Li-Fu Chang, Yao-Ting Wang |
2008-04-15 |
| 7356788 |
Method and apparatus for data hierarchy maintenance in a system for mask description |
Yao-Ting Wang, Yagyensh C. Pati |
2008-04-08 |
| 7216320 |
Delta-geometry timing prediction in integrated circuit fabrication |
Li-Fu Chang, Yao-Ting Wang |
2007-05-08 |
| 7107571 |
Visual analysis and verification system using advanced tools |
Yao-Ting Wang, Yagyensh C. Pati, Linard Karklin |
2006-09-12 |
| 7093229 |
System and method for providing defect printability analysis of photolithographic masks with job-based automation |
Linyong Pang |
2006-08-15 |
| 7052826 |
Monitoring method, process and system for photoresist regeneration |
Ching Chin Lai, Ming-En Chen, Jung Hsiang Chu, Kuang Ling Hsaio, Yun Lin Jang |
2006-05-30 |
| 7014955 |
System and method for indentifying dummy features on a mask layer |
Christophe Pierrat |
2006-03-21 |
| 6996790 |
System and method for generating a two-dimensional yield map for a full layout |
— |
2006-02-07 |
| 6988259 |
Method and apparatus for mixed-mode optical proximity correction |
Christophe Pierrat, You-Ping Zhang, Hoyong Park, Yao-Ting Wang |
2006-01-17 |
| 6976240 |
Simulation using design geometry information |
— |
2005-12-13 |
| 6880135 |
Method of incorporating lens aberration information into various process flows |
Christophe Pierrat, J. Weed |
2005-04-12 |
| 6795168 |
Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process |
Yao-Ting Wang, Christophe Pierrat |
2004-09-21 |
| 6757645 |
Visual inspection and verification system |
Yao-Ting Wang, Yagyensh C. Pati, Linard Karklin |
2004-06-29 |
| 6721928 |
Verification utilizing instance-based hierarchy management |
Christophe Pierrat, Chin-Hsen Lin, Yao-Ting Wang |
2004-04-13 |
| 6584609 |
Method and apparatus for mixed-mode optical proximity correction |
Christophe Pierrat, You-Ping Zhang, Hoyong Park, Yao-Ting Wang |
2003-06-24 |
| 6560766 |
Method and apparatus for analyzing a layout using an instance-based representation |
Christophe Pierrat, Chin-Hsen Lin, Yao-Ting Wang |
2003-05-06 |
| 6523162 |
General purpose shape-based layout processing scheme for IC layout modifications |
Deepak Agrawal, Hyungjip Kim, Yao-Ting Wang, Myunghoon Yoon |
2003-02-18 |
| 6470489 |
Design rule checking system and method |
Yao-Ting Wang, Yagyensh C. Pati |
2002-10-22 |
| 6453452 |
Method and apparatus for data hierarchy maintenance in a system for mask description |
Yao-Ting Wang, Yagyensh C. Pati |
2002-09-17 |
| 6370679 |
Data hierarchy layout correction and verification method and apparatus |
Yao-Ting Wang, Yagyensh C. Pati |
2002-04-09 |