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Organic solid biomass conversion for liquid fuels/chemicals production in the presence of methane containing gas environment and catalyst structure |
— |
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Catalyst structure and method of upgrading hydrocarbons in the presence of the catalyst structure |
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Method of light oil desulfurization in the presence of methane containing gas environment and catalyst structure |
Hao Xu, Zhaofei Li, Yimeng Li |
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Inverse etch model for mask synthesis |
Guangming Xiao |
2023-05-09 |
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Catalyst structure and method of upgrading hydrocarbons in the presence of the catalyst structure |
Blair Aiken, Peng He, Shijun Meng |
2022-07-19 |
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3D resist profile aware resolution enhancement techniques |
Cheng-En Wu, James P. Shiely |
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Fabric items with thermally imprinted light-emitting regions |
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Method for modeling a photoresist profile |
Cheng-En Wu, Haiqing Wei, Qiaolin Zhang |
2019-08-20 |
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Method for preparing trench isolation structure |
Jiao Wang, Huan Yang |
2018-05-15 |
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3D resist profile aware etch-bias model |
Cheng-En Wu, James P. Shiely |
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Modeling and correcting short-range and long-range effects in E-beam lithography |
Irene Y. Su, James P. Shiely |
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Semiconductor device and method for fabricating semiconductor buried layer |
Hsiao-Chia Wu, Tse-Huang Lo |
2014-11-18 |
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Thermoresponsive arginine-based hydrogels as biologic carriers |
Chih-Chang Chu |
2014-10-14 |
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Detection and removal of self-aligned double patterning artifacts |
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Physically aware logic synthesis of integrated circuit designs |
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Multi-patterning for sharp corner printing |
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Modeling EUV lithography shadowing effect |
James P. Shiely, Lena Zavyalova |
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Modeling an arbitrarily polarized illumination source in an optical lithography system |
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2013-09-03 |
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EUV lithography flare calculation and compensation |
James P. Shiely |
2013-05-14 |
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Modeling thin-film stack topography effect on a photolithography process |
James P. Shiely, Qiaolin Zhang |
2013-04-16 |
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Method and system for performing lithography verification for a double-patterning process |
Lantian Wang, Gerard Luk-Pat, James P. Shiely |
2012-03-06 |
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Redox method for capture of total gaseous mercury by wet FGD |
S. Behrooz Ghorishi, Luis G. Velazquez-Vargas, Lei Ji |
2012-01-10 |
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Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout |
Zong Wu Tang, Daniel Zhang, Juhwan Kim, Weiping Fang, Lawrence S. Melvin, III |
2011-04-26 |
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Locating critical dimension(s) of a layout feature in an IC design by modeling simulated intensities |
Lantiang Wang, Zongwu Tang |
2009-12-22 |
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Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout |
Zong Wu Tang, Daniel Zhang, Juhwan Kim, Weiping Fang, Lawrence S. Melvin, III |
2009-09-01 |
