Issued Patents All Time
Showing 25 most recent of 47 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11741287 | Prioritized mask correction | Frank L. Ferschweiler | 2023-08-29 |
| 11556052 | Using mask fabrication models in correction of lithographic masks | Kevin Hooker | 2023-01-17 |
| 11475201 | Inclusion of stochastic behavior in source mask optimization | William A. Stanton, Sylvain Berthiaume, Ulrich Klostermann | 2022-10-18 |
| 11468222 | Stochastic signal prediction in compact modeling | Yudhishthir Prasad Kandel | 2022-10-11 |
| 11402742 | Undercut EUV absorber reflective contrast enhancement | Yudhishthir Prasad Kandel | 2022-08-02 |
| 11314171 | Lithography improvement based on defect probability distributions and critical dimension variations | Yudhishthir Prasad Kandel, Qiliang Yan, Ulrich Klostermann | 2022-04-26 |
| 11187973 | Reflective EUV mask absorber manipulation to improve wafer contrast | Yudhishthir Prasad Kandel | 2021-11-30 |
| 11093680 | Design-prioritized mask correction | Frank L. Ferschweiler | 2021-08-17 |
| 10915031 | Optical source compensation | — | 2021-02-09 |
| 10852635 | Compact modeling for the negative tone development processes | Chun-Chieh Kuo, Jensheng Huang | 2020-12-01 |
| 10365557 | Compact OPC model generation using virtual data | Artak Isoyan | 2019-07-30 |
| 9940694 | Resolution enhancement techniques based on holographic imaging technology | Artak Isoyan | 2018-04-10 |
| 8473271 | Fast photolithography process simulation to predict remaining resist thickness | Artak Isoyan | 2013-06-25 |
| 8184897 | Method and apparatus for determining an optical threshold and a resist bias | Jianliang Li, Qiliang Yan | 2012-05-22 |
| 8181128 | Method and apparatus for determining a photolithography process model which models the influence of topography variations | Jensheng Huang | 2012-05-15 |
| 8136054 | Compact abbe's kernel generation using principal component analysis | Charlie Chen | 2012-03-13 |
| 7973909 | Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography | — | 2011-07-05 |
| 7966582 | Method and apparatus for modeling long-range EUVL flare | Brian S. Ward, Kunal N. Taravade | 2011-06-21 |
| 7934174 | Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout | Zong Wu Tang, Daniel Zhang, Juhwan Kim, Hua Song, Weiping Fang | 2011-04-26 |
| 7934176 | Method and apparatus for determining a process model that models the impact of a CAR/PEB on the resist profile | Jensheng Huang, Chun-Chieh Kuo | 2011-04-26 |
| 7933471 | Method and system for correlating physical model representation to pattern layout | Jianliang Li, Qiliang Yan, James P. Shiely | 2011-04-26 |
| 7853919 | Modeling mask corner rounding effects using multiple mask layers | Jensheng Huang, Chun-Chieh Kuo | 2010-12-14 |
| 7788630 | Method and apparatus for determining an optical model that models the effect of optical proximity correction | Jianliang Li, Qilang Yan | 2010-08-31 |
| 7784018 | Method and apparatus for identifying a manufacturing problem area in a layout using a gradient-magnitude of a process-sensitivity model | James P. Shiely, Qiliang Yan | 2010-08-24 |
| 7743357 | Method and apparatus for determining a process model that models the impact of CAR/PEB on the resist profile | Jensheng Huang, Chun-Chieh Kuo | 2010-06-22 |