KH

Keith J. Hansen

Lsi Logic: 9 patents #181 of 1,957Top 10%
Applied Materials: 4 patents #2,506 of 7,310Top 35%
NS Novellus Systems: 2 patents #345 of 780Top 45%
Lam Research: 1 patents #1,364 of 2,128Top 65%
Overall (All Time): #271,308 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11263737 Defect classification and source analysis for semiconductor equipment Kapil Sawlani, Richard A. Gottscho, Michal Danek, Keith Wells 2022-03-01
8791714 Fault detection apparatuses and methods for fault detection of semiconductor processing tools — 2014-07-29
8120376 Fault detection apparatuses and methods for fault detection of semiconductor processing tools — 2012-02-21
6228186 Method for manufacturing metal sputtering target for use in DC magnetron so that target has reduced number of conduction anomalies Vikram Pavate, Glen T. Mori, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman 2001-05-08
6171455 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target Vikram Pavate, Glen T. Mori, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman 2001-01-09
6126791 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target Vikram Pavate, Glen T. Mori, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman 2000-10-03
6113699 Purging gas control structure for CVD chamber — 2000-09-05
6001227 Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target Vikram Pavate, Glen T. Mori, Murali Narasimhan, Seshadri Ramaswami, Jaim Nulman 1999-12-14
5914001 In-situ etch of CVD chamber — 1999-06-22
5853804 Gas control technique for limiting surging of gas into a CVD chamber — 1998-12-29
5681613 Filtering technique for CVD chamber process gases — 1997-10-28
5391394 Tungsten deposition process for low contact resistivity to silicon — 1995-02-21
5211796 Apparatus for performing in-situ etch of CVD chamber — 1993-05-18
5203956 Method for performing in-situ etch of a CVD chamber — 1993-04-20
5180432 Apparatus for conducting a refractory metal deposition process — 1993-01-19
5123375 Structure for filtering CVD chamber process gases — 1992-06-23
5021980 Remote measurement of temperature Paul Poenisch 1991-06-04