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Home › Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target

Target for use in magnetron sputtering of aluminum for forming metallization films having low defect densities and methods for manufacturing and using such target

US Patent 6126791 · Granted Oct 3, 2000

Estimated economic value: $78,095,000 ⓘ

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