Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for reducing particle concentration within a semiconductor device fabrication tool

Method for reducing particle concentration within a semiconductor device fabrication tool

US Patent 6379428 · Granted Apr 30, 2002

Estimated economic value: $26,677,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Modular substrate support assembly2025
System and method of cleaning process chamber components2024
Methods and apparatus for processing a substrate2023
Compliant robot blade for substrate support and transfer2022
Methods and apparatus for backside via reveal processing2022
Equipment cleaning apparatus and method2020
Variable frequency microwave (VFM) processes and applications in semiconductor t2020
Substrate support apparatus having reduced substrate particle generation2019
Compliant robot blade for defect reduction2019
Variable frequency microwave (VFM) processes and applications in semiconductor t2018
Structure and method of fabricating three-dimensional (3D) metal-insulator-metal2018
Variable frequency microwave (VFM) processes and applications in semiconductor t2017