| 12148629 |
Shutter disk |
Kang Zhang, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi +1 more |
2024-11-19 |
$80,955,000 |
| 12100577 |
High conductance inner shield for process chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada +1 more |
2024-09-24 |
$100,019,000 |
| 12080522 |
Preclean chamber upper shield with showerhead |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Kelvin Boh, Kang Zhang +1 more |
2024-09-03 |
$44,731,000 |
| 11913107 |
Methods and apparatus for processing a substrate |
Yueh Sheng Ow, Yuichi Wada, Kang Zhang, Kelvin Boh |
2024-02-27 |
$57,915,000 |
| 11881385 |
Methods and apparatus for reducing defects in preclean chambers |
Yueh Sheng Ow, Yuichi Wada, Kang Zhang, Ananthkrishna Jupudi, Sarath Babu +2 more |
2024-01-23 |
$48,508,000 |
| 11862480 |
Shutter disk |
Kang Zhang, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi +1 more |
2024-01-02 |
$40,045,000 |
| 11670513 |
Apparatus and systems for substrate processing for lowering contact resistance |
Yueh Sheng Ow, Wen Long Favier Shoo, Ananthkrishna Jupudi, Takashi Shimizu, Kelvin Boh +1 more |
2023-06-06 |
$40,761,000 |
| D973609 |
Upper shield with showerhead for a process chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Kelvin Boh, Kang Zhang +1 more |
2022-12-27 |
|
| D971167 |
Lower shield for a substrate processing chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada +1 more |
2022-11-29 |
|
| 11328929 |
Methods, apparatuses and systems for substrate processing for lowering contact resistance |
Yueh Sheng Ow, Wen Long Favier Shoo, Ananthkrishna Jupudi, Takashi Shimizu, Kelvin Boh +1 more |
2022-05-10 |
$45,778,000 |
| 11171017 |
Shutter disk |
Zhang Kang, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi +1 more |
2021-11-09 |
$68,627,000 |
| D931241 |
Lower shield for a substrate processing chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada +1 more |
2021-09-21 |
|
| 11114288 |
Physical vapor deposition apparatus |
Kirankumar Neelasandra SAVANDAIAH, Yueh Sheng Ow, Wen Long Favier Shoo |
2021-09-07 |
$49,370,000 |
| D913979 |
Inner shield for a substrate processing chamber |
Sarath Babu, Ananthkrishna Jupudi, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada +1 more |
2021-03-23 |
|
| 10115573 |
Apparatus for high compressive stress film deposition to improve kit life |
Kirankumar Neelasandra SAVANDAIAH, Ananthkrishna Jupudi, Zhitao Cao, Yueh Sheng Ow |
2018-10-30 |
$15,195,000 |
| 9960023 |
Methods and apparatus for nodule control in a titanium-tungsten target |
Zhitao Cao, Yueh Sheng Ow, Ananthkrishna Jupudi, Kirankumar Neelasandra SAVANDAIAH, Xin Wang +1 more |
2018-05-01 |
$18,276,000 |
