KY

Keishin Yamazaki

HE Hitachi Kokusai Electric: 10 patents #85 of 843Top 15%
KE Kokusai Electric: 3 patents #177 of 583Top 35%
📍 Toyama, JP: #227 of 1,699 inventorsTop 15%
Overall (All Time): #365,593 of 4,157,543Top 9%
13
Patents All Time

Issued Patents All Time

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
12387969 Substrate processing apparatus, substrate holding apparatus, and method of manufacturing semiconductor device Norichika Yamagishi 2025-08-12
11377730 Substrate processing apparatus and furnace opening cover Kosuke Takagi, Shinya Morita, Naonori Akae 2022-07-05
10351951 Substrate treatment apparatus including reaction tube with opened lower end, furnace opening member, and flange configured to cover upper surface of the furnace opening member Satoru Murata, Shinya Morita 2019-07-16
9816182 Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium Hideto Tateno, Yuichi Wada, Hiroshi Ashihara, Takurou Ushida, Iwao Nakamura +1 more 2017-11-14
D739832 Reaction tube Masahiro Miyake, Shinya Morita, Kosuke Takagi, Yasuaki Komae, Naonori Akae +3 more 2015-09-29
D725055 Reaction tube Masahiro Miyake, Kosuke Takagi, Yasuaki Komae, Shinya Morita, Naonori Akae +1 more 2015-03-24
8963051 Heat treatment apparatus and method of manufacturing substrates Tomoharu SHIMADA, Akira Morohashi, Kojiro Yokozawa 2015-02-24
D720707 Reaction tube Masahiro Miyake, Kosuke Takagi, Yasuaki Komae, Shinya Morita, Naonori Akae +1 more 2015-01-06
D719114 Reaction tube Masahiro Miyake, Kosuke Takagi, Yasuaki Komae, Shinya Morita, Naonori Akae +1 more 2014-12-09
D711843 Reaction tube Masahiro Miyake, Kosuke Takagi, Yasuaki Komae, Shinya Morita, Naonori Akae +1 more 2014-08-26
8734148 Heat treatment apparatus and method of manufacturing semiconductor device Akira Hayashida, Masaaki Ueno, Manabu Izumi, Katsuaki NOGAMI 2014-05-27
7901206 Heat-treating apparatus and method of producing substrates Akira Morohashi, Iwao Nakamura, Ryota Sasajima, Sadao Nakashima 2011-03-08
7820118 Substrate processing apparatus having covered thermocouple for enhanced temperature control Iwao Nakamura, Ryota Sasajima 2010-10-26