Issued Patents All Time
Showing 1–25 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11462401 | Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium | Kosuke Takagi, Masato Terasaki, Mikio Ohno | 2022-10-04 |
| 11377730 | Substrate processing apparatus and furnace opening cover | Kosuke Takagi, Shinya Morita, Keishin Yamazaki | 2022-07-05 |
| 10513775 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Risa YAMAKOSHI, Masato Terasaki, Takashi Ozaki, Hideki Horita | 2019-12-24 |
| 10513774 | Substrate processing apparatus and guide portion | Masato Terasaki, Hideki Horita | 2019-12-24 |
| 10081868 | Gas supply nozzle, substrate processing apparatus, and non-transitory computer-readable recording medium | Kosuke Takagi, Ryota Sasajima, Shintaro Kogura, Risa YAMAKOSHI, Toshiki Fujino +2 more | 2018-09-25 |
| 9966252 | Method of manufacturing semiconductor device and substrate processing apparatus | Ryota Sasajima, Yoshiro Hirose, Yosuke Ota, Kojiro Yokozawa | 2018-05-08 |
| 9966251 | Method of manufacturing semiconductor device and substrate processing apparatus | Ryota Sasajima, Yoshiro Hirose, Yosuke Ota, Kojiro Yokozawa | 2018-05-08 |
| 9905413 | Method of manufacturing semiconductor device | Risa YAMAKOSHI, Takashi Ozaki, Masato Terasaki, Hideki Horita | 2018-02-27 |
| 9685317 | Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium | Kazuhiro Yuasa | 2017-06-20 |
| 9601326 | Method of manufacturing semiconductor device, including film having uniform thickness | Tatsuya Yotsutani | 2017-03-21 |
| D773609 | Return nozzle | Shinya Morita, Masahiro Miyake, Masato Terasaki, Naoki Matsumoto | 2016-12-06 |
| 9508546 | Method of manufacturing semiconductor device | Kazuyuki Toyoda, Tadashi Takasaki, Hiroshi Ashihara, Atsushi Sano, Hidehiro Yanai | 2016-11-29 |
| D771543 | Return nozzle | Shinya Morita, Masahiro Miyake, Masato Terasaki, Naoki Matsumoto | 2016-11-15 |
| D771772 | Return nozzle | Shinya Morita, Masahiro Miyake, Masato Terasaki, Naoki Matsumoto | 2016-11-15 |
| 9425075 | Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium | Atsushi Sano, Yoshiro Hirose | 2016-08-23 |
| 9401272 | Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium | Masato Terasaki, Hideki Horita | 2016-07-26 |
| 9269566 | Substrate processing apparatus | Yoshiro Hirose, Yushin Takasawa, Yosuke Ota | 2016-02-23 |
| 9196473 | Method of manufacturing an oxynitride film for a semiconductor device | Yosuke Ota, Yoshiro Hirose, Yushin Takasawa | 2015-11-24 |
| 9190264 | Method of manufacturing semiconductor device, method of processing substrate and non-transitory computer readable recording medium | Kazuhiro Yuasa, Masato Terasaki | 2015-11-17 |
| D739832 | Reaction tube | Keishin Yamazaki, Masahiro Miyake, Shinya Morita, Kosuke Takagi, Yasuaki Komae +3 more | 2015-09-29 |
| 9096928 | Method of manufacturing semiconductor device and substrate processing apparatus | Ryota Sasajima, Yoshiro Hirose, Osamu Kasahara | 2015-08-04 |
| 9039838 | Method of manufacturing semiconductor device and substrate processing apparatus | Ryota Sasajima, Yoshiro Hirose, Yosuke Ota, Kojiro Yokozawa | 2015-05-26 |
| 9011601 | Substrate processing apparatus | Yoshiro Hirose, Yushin Takasawa, Yosuke Ota | 2015-04-21 |
| D725055 | Reaction tube | Keishin Yamazaki, Masahiro Miyake, Kosuke Takagi, Yasuaki Komae, Shinya Morita +1 more | 2015-03-24 |
| 8925562 | Substrate processing apparatus and method of manufacturing semiconductor device | Kazuyuki Toyoda, Tadashi Takasaki, Hiroshi Ashihara, Atsushi Sano, Hidehiro Yanai | 2015-01-06 |